Redox Reactions in a Layer of Adsorbed Cu(II) and Fe(II) Ions and Synthesis of 2D CuFeO2 Ultrathin Nanosheets by Successive Ionic Layer Deposition

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Redox Reactions in a Layer of Adsorbed Cu(II) and Fe(II) Ions and Synthesis of 2D CuFeO2 Ultrathin Nanosheets by Successive Ionic Layer Deposition. / Мелешко, Александра Александровна ; Толстой, Валерий Павлович.

In: ЖУРНАЛ ОБЩЕЙ ХИМИИ, Vol. 94, No. Suppl 1, 2024, p. S13-S19.

Research output: Contribution to journal › Article › peer-review

BibTeX

@article{98c8c7b58602442587b56582464126df,

title = "Redox Reactions in a Layer of Adsorbed Cu(II) and Fe(II) Ions and Synthesis of 2D CuFeO2 Ultrathin Nanosheets by Successive Ionic Layer Deposition",

abstract = "Abstract: The 2D CuFeO2·H2O nanocrystals with a nanosheet morphology were obtained for the first time by successive ionic layer deposition (SILD) from solutions of the Mohr salt and copper(II) ammonium complex at room temperature. The SILD modification leads to a change in silicon surface wetting angles. Based on the experimental data obtained, schemes of chemical reactions occurring on the substrate surface during treatment with each of the reagents were constructed. The contact angle of a water drop on a silicon surface depends significantly on the SILD cycles number. When the number of SILD cycles changes from 2 to 15, the contact angles change from 63 to 3 degrees. The last value indicates the achievement of the surface superhydrophilicity.",

keywords = "delafossite, 2D nanocrystals, SILD, superhydrophilicity, 2D nanocrystals, SILD, delafossite, superhydrophilicity",

author = "Мелешко, {Александра Александровна} and Толстой, {Валерий Павлович}",

year = "2024",

doi = "10.1134/s1070363224140020",

language = "English",

volume = "94",

pages = "S13--S19",

journal = "ЖУРНАЛ ОБЩЕЙ ХИМИИ",

issn = "0044-460X",

publisher = "Издательство {"}Наука{"}",

number = "Suppl 1",

}

RIS

TY - JOUR

T1 - Redox Reactions in a Layer of Adsorbed Cu(II) and Fe(II) Ions and Synthesis of 2D CuFeO2 Ultrathin Nanosheets by Successive Ionic Layer Deposition

AU - Мелешко, Александра Александровна

AU - Толстой, Валерий Павлович

PY - 2024

Y1 - 2024

N2 - Abstract: The 2D CuFeO2·H2O nanocrystals with a nanosheet morphology were obtained for the first time by successive ionic layer deposition (SILD) from solutions of the Mohr salt and copper(II) ammonium complex at room temperature. The SILD modification leads to a change in silicon surface wetting angles. Based on the experimental data obtained, schemes of chemical reactions occurring on the substrate surface during treatment with each of the reagents were constructed. The contact angle of a water drop on a silicon surface depends significantly on the SILD cycles number. When the number of SILD cycles changes from 2 to 15, the contact angles change from 63 to 3 degrees. The last value indicates the achievement of the surface superhydrophilicity.

AB - Abstract: The 2D CuFeO2·H2O nanocrystals with a nanosheet morphology were obtained for the first time by successive ionic layer deposition (SILD) from solutions of the Mohr salt and copper(II) ammonium complex at room temperature. The SILD modification leads to a change in silicon surface wetting angles. Based on the experimental data obtained, schemes of chemical reactions occurring on the substrate surface during treatment with each of the reagents were constructed. The contact angle of a water drop on a silicon surface depends significantly on the SILD cycles number. When the number of SILD cycles changes from 2 to 15, the contact angles change from 63 to 3 degrees. The last value indicates the achievement of the surface superhydrophilicity.

KW - delafossite

KW - 2D nanocrystals

KW - SILD

KW - superhydrophilicity

KW - 2D nanocrystals

KW - SILD

KW - delafossite

KW - superhydrophilicity

UR - https://www.mendeley.com/catalogue/fc2399e4-7aac-3a48-a4a2-ae08e6ec8acd/

U2 - 10.1134/s1070363224140020

DO - 10.1134/s1070363224140020

M3 - Article

VL - 94

SP - S13-S19

JO - ЖУРНАЛ ОБЩЕЙ ХИМИИ

JF - ЖУРНАЛ ОБЩЕЙ ХИМИИ

SN - 0044-460X

IS - Suppl 1

ER -

ID: 117492862