This study presents an effective plasma treatment method for doping technical carbon by nitrogen- and sulfur-containing functional groups. Nitrogen incorporation shifted the oxygen reduction reaction onset potential by 0.25 V and increased the limiting current by 1 mA cm−2, while sulfuration showed a more pronounced effect, with a 0.31 V shift in onset potential and an increase in the limiting current to 6.23 mA cm−2. These enhancements are attributed to the formation of additional active sites and improved surface properties. The proposed plasma-based approach is simple, scalable, and environmentally friendly, minimizing the use of hazardous reagents and eliminating the need for multistep processes. This method demonstrates the potential for industrial applications using commercially available raw materials such as technical carbon and to be extended to other carbon-based materials.