Research output: Contribution to journal › Article › peer-review
We study the effect of thermal oxygen exposure on a monolayer of h-BN grown on vicinal Ni surfaces by scanning tunneling microscopy, X-ray absorption, and photoemission spectroscopies. Using a curved Ni crystal, we carry out a systematic exploration of the h-BN monolayer interfacing a full variety of vicinal orientations around the (111) high-symmetry direction. We demonstrate the occurrence of two processes upon oxygen exposure: oxygen intercalation underneath the h-BN layer, which leads to decoupling of the h-BN from the substrate, and oxidation of h-BN itself, which proceeds via substitution of nitrogen atoms. Oxygen intercalation appears to be substrate orientation dependent, while oxidation of h-BN is rather uniform over the different vicinal planes. These findings will be of importance for future applications of BN-based devices and materials under ambient conditions. ©
Original language | English |
---|---|
Pages (from-to) | 593-602 |
Number of pages | 10 |
Journal | Journal of Physical Chemistry C |
Volume | 123 |
Issue number | 1 |
DOIs | |
State | Published - 1 Oct 2019 |
ID: 38759966