Standard

Oxidation effects in epitaxial Fe3O4 layers on MgO and MgAl2O4 substrates studied by X-ray absorption, fluorescence and photoemission. / Krasnikov, S. A.; Vinogradov, A. S.; Hallmeier, K. H.; Chassé, T.; Szargan, R.

In: Materials Science and Engineering B: Solid-State Materials for Advanced Technology, Vol. 109, No. 1-3, 15.06.2004, p. 207-212.

Research output: Contribution to journal › Conference article › peer-review

Harvard

Krasnikov, SA, Vinogradov, AS, Hallmeier, KH, Chassé, T & Szargan, R 2004, 'Oxidation effects in epitaxial Fe3O4 layers on MgO and MgAl2O4 substrates studied by X-ray absorption, fluorescence and photoemission', Materials Science and Engineering B: Solid-State Materials for Advanced Technology, vol. 109, no. 1-3, pp. 207-212. https://doi.org/10.1016/j.mseb.2003.10.066

APA

Krasnikov, S. A., Vinogradov, A. S., Hallmeier, K. H., Chassé, T., & Szargan, R. (2004). Oxidation effects in epitaxial Fe3O4 layers on MgO and MgAl2O4 substrates studied by X-ray absorption, fluorescence and photoemission. Materials Science and Engineering B: Solid-State Materials for Advanced Technology, 109(1-3), 207-212. https://doi.org/10.1016/j.mseb.2003.10.066

Vancouver

Krasnikov SA, Vinogradov AS, Hallmeier KH, Chassé T, Szargan R. Oxidation effects in epitaxial Fe3O4 layers on MgO and MgAl2O4 substrates studied by X-ray absorption, fluorescence and photoemission. Materials Science and Engineering B: Solid-State Materials for Advanced Technology. 2004 Jun 15;109(1-3):207-212. https://doi.org/10.1016/j.mseb.2003.10.066

Author

Krasnikov, S. A. ; Vinogradov, A. S. ; Hallmeier, K. H. ; Chassé, T. ; Szargan, R. / Oxidation effects in epitaxial Fe3O4 layers on MgO and MgAl2O4 substrates studied by X-ray absorption, fluorescence and photoemission. In: Materials Science and Engineering B: Solid-State Materials for Advanced Technology. 2004 ; Vol. 109, No. 1-3. pp. 207-212.

BibTeX

@article{8face122477b4f3b8f428e8a91c7d9f7,
title = "Oxidation effects in epitaxial Fe3O4 layers on MgO and MgAl2O4 substrates studied by X-ray absorption, fluorescence and photoemission",
abstract = "Fe3O4 films of different thickness were epitaxially grown on single crystal MgO and MgAl2O4 substrates and studied by X-ray absorption, X-ray photoemission spectroscopy and X-ray fluorescence (XF). All samples were prepared by pulsed laser deposition (PLD) and some of them were covered by in situ prepared thin BaTiO3 protecting layer. The photoemission (VG ESCALAB 220i-XL) and absorption (total electron yield mode) measurements on epitaxial Fe3O4 films demonstrate the important role of the protecting layer to prevent the further oxidation of Fe3O4 to Fe2O3 in the case of thin films (2.5nm range). The resonant XF (X-ray monochromator XES 300 using synchrotron radiation at the U41-PGM beam-line at BESSY II) measurements at excitation energy 710eV (Fe L3 absorption edge) demonstrate the effect of the Fe 3d-O 2p hybridization in the iron oxide layers. Information about local partial densities of states was obtained for the oxidized Fe 3O4 film from a comparative analysis of the Fe L and O K XF and the valence-band photoelectron spectra.",
keywords = "Epitaxy, Iron oxides, Pulsed laser deposition, X-ray absorption, X-ray fluorescence, X-ray photoemission",
author = "Krasnikov, {S. A.} and Vinogradov, {A. S.} and Hallmeier, {K. H.} and T. Chass{\'e} and R. Szargan",
note = "Copyright: Copyright 2008 Elsevier B.V., All rights reserved.; EMRS 2003, Symposium I, Funtional Metal Oxides - Semiconductors ; Conference date: 10-06-2003 Through 13-06-2003",
year = "2004",
month = jun,
day = "15",
doi = "10.1016/j.mseb.2003.10.066",
language = "English",
volume = "109",
pages = "207--212",
journal = "Materials Science and Engineering B",
issn = "0921-5107",
publisher = "Elsevier",
number = "1-3",

}

RIS

TY - JOUR

T1 - Oxidation effects in epitaxial Fe3O4 layers on MgO and MgAl2O4 substrates studied by X-ray absorption, fluorescence and photoemission

AU - Krasnikov, S. A.

AU - Vinogradov, A. S.

AU - Hallmeier, K. H.

AU - Chassé, T.

AU - Szargan, R.

N1 - Copyright: Copyright 2008 Elsevier B.V., All rights reserved.

PY - 2004/6/15

Y1 - 2004/6/15

N2 - Fe3O4 films of different thickness were epitaxially grown on single crystal MgO and MgAl2O4 substrates and studied by X-ray absorption, X-ray photoemission spectroscopy and X-ray fluorescence (XF). All samples were prepared by pulsed laser deposition (PLD) and some of them were covered by in situ prepared thin BaTiO3 protecting layer. The photoemission (VG ESCALAB 220i-XL) and absorption (total electron yield mode) measurements on epitaxial Fe3O4 films demonstrate the important role of the protecting layer to prevent the further oxidation of Fe3O4 to Fe2O3 in the case of thin films (2.5nm range). The resonant XF (X-ray monochromator XES 300 using synchrotron radiation at the U41-PGM beam-line at BESSY II) measurements at excitation energy 710eV (Fe L3 absorption edge) demonstrate the effect of the Fe 3d-O 2p hybridization in the iron oxide layers. Information about local partial densities of states was obtained for the oxidized Fe 3O4 film from a comparative analysis of the Fe L and O K XF and the valence-band photoelectron spectra.

AB - Fe3O4 films of different thickness were epitaxially grown on single crystal MgO and MgAl2O4 substrates and studied by X-ray absorption, X-ray photoemission spectroscopy and X-ray fluorescence (XF). All samples were prepared by pulsed laser deposition (PLD) and some of them were covered by in situ prepared thin BaTiO3 protecting layer. The photoemission (VG ESCALAB 220i-XL) and absorption (total electron yield mode) measurements on epitaxial Fe3O4 films demonstrate the important role of the protecting layer to prevent the further oxidation of Fe3O4 to Fe2O3 in the case of thin films (2.5nm range). The resonant XF (X-ray monochromator XES 300 using synchrotron radiation at the U41-PGM beam-line at BESSY II) measurements at excitation energy 710eV (Fe L3 absorption edge) demonstrate the effect of the Fe 3d-O 2p hybridization in the iron oxide layers. Information about local partial densities of states was obtained for the oxidized Fe 3O4 film from a comparative analysis of the Fe L and O K XF and the valence-band photoelectron spectra.

KW - Epitaxy

KW - Iron oxides

KW - Pulsed laser deposition

KW - X-ray absorption

KW - X-ray fluorescence

KW - X-ray photoemission

UR - http://www.scopus.com/inward/record.url?scp=2342584760&partnerID=8YFLogxK

U2 - 10.1016/j.mseb.2003.10.066

DO - 10.1016/j.mseb.2003.10.066

M3 - Conference article

AN - SCOPUS:2342584760

VL - 109

SP - 207

EP - 212

JO - Materials Science and Engineering B

JF - Materials Science and Engineering B

SN - 0921-5107

IS - 1-3

T2 - EMRS 2003, Symposium I, Funtional Metal Oxides - Semiconductors

Y2 - 10 June 2003 through 13 June 2003

ER -

ID: 76051552