Optimization of microsphere optical lithography for nano-patterning

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Optimization of microsphere optical lithography for nano-patterning. / Dvoretckaia, Liliia N.; Mozharov, Alexey M.; Berdnikov, Yury ; Mukhin, Ivan S.

In: Journal of Physics D: Applied Physics, Vol. 55, No. 9, 09LT01, 03.03.2022.

Research output: Contribution to journal › Article › peer-review

BibTeX

@article{08890d6c22e64824a347e76d5b42354c,

title = "Optimization of microsphere optical lithography for nano-patterning",

abstract = "We present an original approach to realistic modeling of light focusing by microsphere systems to form the photonic jets for nano-patterning of the substrates with high refractive index. In simulations we analyze the photonic jets produced by a single sphere and close-packed array of microspheres on the photoresist layer and Si substrate. We show how the lithographic profiles can be controlled by varying the exposure dose and system geometry in wide ranges of photoresist layer thicknesses and microsphere sizes. The modeling covers the entire lithographic system and accounts for the interference of focused light transmitted through the microlenses and reflected from the Si substrate. We use our approach to optimize the size of the lithographic pattern and confirm the simulation results experimentally. The suggested set of methods is rather universal and may be applied to other microlens and resist materials to minimize lithography lateral resolution. ",

keywords = "growth mask, microsphere lithography, near-field effect, photolithography modeling, Si, SiOmicrospheres",

author = "Dvoretckaia, {Liliia N.} and Mozharov, {Alexey M.} and Yury Berdnikov and Mukhin, {Ivan S.}",

note = "Publisher Copyright: {\textcopyright} 2021 IOP Publishing Ltd.",

year = "2022",

month = mar,

day = "3",

doi = "10.1088/1361-6463/ac368d",

language = "English",

volume = "55",

journal = "Journal Physics D: Applied Physics",

issn = "0022-3727",

publisher = "IOP Publishing Ltd.",

number = "9",

}

RIS

TY - JOUR

T1 - Optimization of microsphere optical lithography for nano-patterning

AU - Dvoretckaia, Liliia N.

AU - Mozharov, Alexey M.

AU - Berdnikov, Yury

AU - Mukhin, Ivan S.

PY - 2022/3/3

Y1 - 2022/3/3

N2 - We present an original approach to realistic modeling of light focusing by microsphere systems to form the photonic jets for nano-patterning of the substrates with high refractive index. In simulations we analyze the photonic jets produced by a single sphere and close-packed array of microspheres on the photoresist layer and Si substrate. We show how the lithographic profiles can be controlled by varying the exposure dose and system geometry in wide ranges of photoresist layer thicknesses and microsphere sizes. The modeling covers the entire lithographic system and accounts for the interference of focused light transmitted through the microlenses and reflected from the Si substrate. We use our approach to optimize the size of the lithographic pattern and confirm the simulation results experimentally. The suggested set of methods is rather universal and may be applied to other microlens and resist materials to minimize lithography lateral resolution.

AB - We present an original approach to realistic modeling of light focusing by microsphere systems to form the photonic jets for nano-patterning of the substrates with high refractive index. In simulations we analyze the photonic jets produced by a single sphere and close-packed array of microspheres on the photoresist layer and Si substrate. We show how the lithographic profiles can be controlled by varying the exposure dose and system geometry in wide ranges of photoresist layer thicknesses and microsphere sizes. The modeling covers the entire lithographic system and accounts for the interference of focused light transmitted through the microlenses and reflected from the Si substrate. We use our approach to optimize the size of the lithographic pattern and confirm the simulation results experimentally. The suggested set of methods is rather universal and may be applied to other microlens and resist materials to minimize lithography lateral resolution.

KW - growth mask

KW - microsphere lithography

KW - near-field effect

KW - photolithography modeling

KW - Si

KW - SiOmicrospheres

UR - http://www.scopus.com/inward/record.url?scp=85120657149&partnerID=8YFLogxK

UR - https://www.mendeley.com/catalogue/a06b8cb5-2d78-33ce-8308-3e4fb096237f/

U2 - 10.1088/1361-6463/ac368d

DO - 10.1088/1361-6463/ac368d

M3 - Article

AN - SCOPUS:85120657149

VL - 55

JO - Journal Physics D: Applied Physics

JF - Journal Physics D: Applied Physics

SN - 0022-3727

IS - 9

M1 - 09LT01

ER -

ID: 88773230