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Optimal lithium targets for laser-plasma lithography. / Andreev, A. A.; Ueda, T.; Limpouch, J.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 4343, No. 1, 20.08.2001, p. 789-796.

Research output: Contribution to journal › Article › peer-review

Harvard

Andreev, AA, Ueda, T & Limpouch, J 2001, 'Optimal lithium targets for laser-plasma lithography', Proceedings of SPIE - The International Society for Optical Engineering, vol. 4343, no. 1, pp. 789-796. https://doi.org/10.1117/12.436706

APA

Andreev, A. A., Ueda, T., & Limpouch, J. (2001). Optimal lithium targets for laser-plasma lithography. Proceedings of SPIE - The International Society for Optical Engineering, 4343(1), 789-796. https://doi.org/10.1117/12.436706

Vancouver

Andreev AA, Ueda T, Limpouch J. Optimal lithium targets for laser-plasma lithography. Proceedings of SPIE - The International Society for Optical Engineering. 2001 Aug 20;4343(1):789-796. https://doi.org/10.1117/12.436706

Author

Andreev, A. A. ; Ueda, T. ; Limpouch, J. / Optimal lithium targets for laser-plasma lithography. In: Proceedings of SPIE - The International Society for Optical Engineering. 2001 ; Vol. 4343, No. 1. pp. 789-796.

BibTeX

@article{bbb380534fb543cdad56bd6345bdcbd6,
title = "Optimal lithium targets for laser-plasma lithography",
abstract = "Lithium containing droplet and cluster targets irradiated by laser pulses were proposed as prospective source for soft x-ray lithography. Laser with repetition rate of several MHz and pulse duration of 10 ps was utilized to produce required radiation x-ray lithography when an optimum target was used. Analytical model and simulations showed that of lasers with energy of several mJ was required for the purpose. The use of laser pre-pulses to enhance laser conversion into emission at desired wavelengths was also proposed.",
keywords = "Debris reduction, Laser-produced plasmas, Soft x-ray source",
author = "Andreev, {A. A.} and T. Ueda and J. Limpouch",
year = "2001",
month = aug,
day = "20",
doi = "10.1117/12.436706",
language = "English",
volume = "4343",
pages = "789--796",
journal = "Proceedings of SPIE - The International Society for Optical Engineering",
issn = "0277-786X",
publisher = "SPIE",
number = "1",

}

RIS

TY - JOUR

T1 - Optimal lithium targets for laser-plasma lithography

AU - Andreev, A. A.

AU - Ueda, T.

AU - Limpouch, J.

PY - 2001/8/20

Y1 - 2001/8/20

N2 - Lithium containing droplet and cluster targets irradiated by laser pulses were proposed as prospective source for soft x-ray lithography. Laser with repetition rate of several MHz and pulse duration of 10 ps was utilized to produce required radiation x-ray lithography when an optimum target was used. Analytical model and simulations showed that of lasers with energy of several mJ was required for the purpose. The use of laser pre-pulses to enhance laser conversion into emission at desired wavelengths was also proposed.

AB - Lithium containing droplet and cluster targets irradiated by laser pulses were proposed as prospective source for soft x-ray lithography. Laser with repetition rate of several MHz and pulse duration of 10 ps was utilized to produce required radiation x-ray lithography when an optimum target was used. Analytical model and simulations showed that of lasers with energy of several mJ was required for the purpose. The use of laser pre-pulses to enhance laser conversion into emission at desired wavelengths was also proposed.

KW - Debris reduction

KW - Laser-produced plasmas

KW - Soft x-ray source

UR - http://www.scopus.com/inward/record.url?scp=0034762438&partnerID=8YFLogxK

U2 - 10.1117/12.436706

DO - 10.1117/12.436706

M3 - Article

AN - SCOPUS:0034762438

VL - 4343

SP - 789

EP - 796

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

SN - 0277-786X

IS - 1

ER -

ID: 86385531