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Nanoscale W/Be multilayers : Intermixing during magnetron sputtering deposition and effect of heat treatment. / Sakhonenkov, Sergei S.; Filatova, Elena O.

In: Applied Surface Science, Vol. 571, 151265, 01.01.2022.

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@article{d295cb01e3e446649d8a1a090556188a,
title = "Nanoscale W/Be multilayers: Intermixing during magnetron sputtering deposition and effect of heat treatment",
abstract = "An atomistic study of the W and Be mixing during magnetron sputtering deposition using the SRIM software based on the binary collision simulation by Monte Carlo method is presented. The calculations performed clearly show a strong correlation between the sort of sputtered atoms, their kinetic energies and the asymmetry of interfaces in the model Si/W(40 nm)/Be(4 nm) and Si/Be(40 nm)/W(1.2 nm) systems. The carried out analysis indicates that the stoichiometry of a beryllide (WBex) at an interface during magnetron sputtering is mainly determined by the kinetic energy of incident atoms. The results of the simulations are in good agreement with experimental data. Analysis of the Si/[W(1.1 nm)/Be(1.4 nm)]200 multilayer structure reveals a complete mixing of the layers with the formation of only beryllides. A pure beryllium was detected in the structure Si/[Be(2.62 nm)/W(0.62 nm)]100 where the period of the system and the thickness of the Be layer are more extended, however pure tungsten was not observed. Annealing of the model samples indicates that heating at temperature 350 °C leads to increasing in the WBe12 beryllide at the Be-on-W interface. Annealing of the multilayer structures yields an increase of WBe2 and a decrease of WBe12 with the temperature growth.",
keywords = "Annealing, Intermixing, Magnetron sputtering, Nanoscale multilayers, X-ray photoelectron spectroscopy, SOFT-X-RAY, BERYLLIUM-OXIDE, ENERGY, FILMS, TUNGSTEN, ATOMS, MIRRORS",
author = "Sakhonenkov, {Sergei S.} and Filatova, {Elena O.}",
note = "Funding Information: This work was supported by The Russian Foundation for Basic Research grant No. 20-32-90024 ?Ac??pa???? in part of the study of annealing effect and Russian Science Foundation grant No. 19-72-20125 in part of theoretical study of interface formation mechanism during magnetron sputtering. We gratefully acknowledge the Resource Centers of the Research Park of St-Petersburg State University ?Physical methods of surface investigation?. We thank DESY for the allocation of synchrotron radiation beamtime. Sincere thanks are due to Dr. Andrei Gloskovskii (DESY, Hamburg) for excellent support during the beamtimes at beamline P22, PETRA III and Mr. Roman Pleshkov for preparing the samples. Funding Information: This work was supported by The Russian Foundation for Basic Research grant No. 20-32-90024 “Acпиpaнты” in part of the study of annealing effect and Russian Science Foundation grant No. 19-72-20125 in part of theoretical study of interface formation mechanism during magnetron sputtering. We gratefully acknowledge the Resource Centers of the Research Park of St-Petersburg State University “Physical methods of surface investigation”. We thank DESY for the allocation of synchrotron radiation beamtime. Sincere thanks are due to Dr. Andrei Gloskovskii (DESY, Hamburg) for excellent support during the beamtimes at beamline P22, PETRA III and Mr. Roman Pleshkov for preparing the samples. Funding Information: The Russian Foundation for Basic Research grant No. 20-32-90024 “Acпиpaнты” and Russian Science Foundation grant No. 19-72-20125. Publisher Copyright: {\textcopyright} 2021 Elsevier B.V.",
year = "2022",
month = jan,
day = "1",
doi = "10.1016/j.apsusc.2021.151265",
language = "English",
volume = "571",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",

}

RIS

TY - JOUR

T1 - Nanoscale W/Be multilayers

T2 - Intermixing during magnetron sputtering deposition and effect of heat treatment

AU - Sakhonenkov, Sergei S.

AU - Filatova, Elena O.

N1 - Funding Information: This work was supported by The Russian Foundation for Basic Research grant No. 20-32-90024 ?Ac??pa???? in part of the study of annealing effect and Russian Science Foundation grant No. 19-72-20125 in part of theoretical study of interface formation mechanism during magnetron sputtering. We gratefully acknowledge the Resource Centers of the Research Park of St-Petersburg State University ?Physical methods of surface investigation?. We thank DESY for the allocation of synchrotron radiation beamtime. Sincere thanks are due to Dr. Andrei Gloskovskii (DESY, Hamburg) for excellent support during the beamtimes at beamline P22, PETRA III and Mr. Roman Pleshkov for preparing the samples. Funding Information: This work was supported by The Russian Foundation for Basic Research grant No. 20-32-90024 “Acпиpaнты” in part of the study of annealing effect and Russian Science Foundation grant No. 19-72-20125 in part of theoretical study of interface formation mechanism during magnetron sputtering. We gratefully acknowledge the Resource Centers of the Research Park of St-Petersburg State University “Physical methods of surface investigation”. We thank DESY for the allocation of synchrotron radiation beamtime. Sincere thanks are due to Dr. Andrei Gloskovskii (DESY, Hamburg) for excellent support during the beamtimes at beamline P22, PETRA III and Mr. Roman Pleshkov for preparing the samples. Funding Information: The Russian Foundation for Basic Research grant No. 20-32-90024 “Acпиpaнты” and Russian Science Foundation grant No. 19-72-20125. Publisher Copyright: © 2021 Elsevier B.V.

PY - 2022/1/1

Y1 - 2022/1/1

N2 - An atomistic study of the W and Be mixing during magnetron sputtering deposition using the SRIM software based on the binary collision simulation by Monte Carlo method is presented. The calculations performed clearly show a strong correlation between the sort of sputtered atoms, their kinetic energies and the asymmetry of interfaces in the model Si/W(40 nm)/Be(4 nm) and Si/Be(40 nm)/W(1.2 nm) systems. The carried out analysis indicates that the stoichiometry of a beryllide (WBex) at an interface during magnetron sputtering is mainly determined by the kinetic energy of incident atoms. The results of the simulations are in good agreement with experimental data. Analysis of the Si/[W(1.1 nm)/Be(1.4 nm)]200 multilayer structure reveals a complete mixing of the layers with the formation of only beryllides. A pure beryllium was detected in the structure Si/[Be(2.62 nm)/W(0.62 nm)]100 where the period of the system and the thickness of the Be layer are more extended, however pure tungsten was not observed. Annealing of the model samples indicates that heating at temperature 350 °C leads to increasing in the WBe12 beryllide at the Be-on-W interface. Annealing of the multilayer structures yields an increase of WBe2 and a decrease of WBe12 with the temperature growth.

AB - An atomistic study of the W and Be mixing during magnetron sputtering deposition using the SRIM software based on the binary collision simulation by Monte Carlo method is presented. The calculations performed clearly show a strong correlation between the sort of sputtered atoms, their kinetic energies and the asymmetry of interfaces in the model Si/W(40 nm)/Be(4 nm) and Si/Be(40 nm)/W(1.2 nm) systems. The carried out analysis indicates that the stoichiometry of a beryllide (WBex) at an interface during magnetron sputtering is mainly determined by the kinetic energy of incident atoms. The results of the simulations are in good agreement with experimental data. Analysis of the Si/[W(1.1 nm)/Be(1.4 nm)]200 multilayer structure reveals a complete mixing of the layers with the formation of only beryllides. A pure beryllium was detected in the structure Si/[Be(2.62 nm)/W(0.62 nm)]100 where the period of the system and the thickness of the Be layer are more extended, however pure tungsten was not observed. Annealing of the model samples indicates that heating at temperature 350 °C leads to increasing in the WBe12 beryllide at the Be-on-W interface. Annealing of the multilayer structures yields an increase of WBe2 and a decrease of WBe12 with the temperature growth.

KW - Annealing

KW - Intermixing

KW - Magnetron sputtering

KW - Nanoscale multilayers

KW - X-ray photoelectron spectroscopy

KW - SOFT-X-RAY

KW - BERYLLIUM-OXIDE

KW - ENERGY

KW - FILMS

KW - TUNGSTEN

KW - ATOMS

KW - MIRRORS

UR - http://www.scopus.com/inward/record.url?scp=85115028210&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2021.151265

DO - 10.1016/j.apsusc.2021.151265

M3 - Article

AN - SCOPUS:85115028210

VL - 571

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

M1 - 151265

ER -

ID: 85828121