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Nanoscale Cu2O films : Radio-frequency magnetron sputtering and structural and optical studies. / Kudryashov, D. A.; Gudovskikh, A. S.; Babichev, A. V.; Filimonov, V.; Mozharov, A. M.; Agekyan, V. F.; Borisov, E. V.; Serov, A. Yu; Filosofov, N. G.

In: Semiconductors, Vol. 51, No. 1, 01.01.2017, p. 110-114.

Research output: Contribution to journal › Article › peer-review

Harvard

Kudryashov, DA, Gudovskikh, AS, Babichev, AV, Filimonov, V, Mozharov, AM, Agekyan, VF, Borisov, EV, Serov, AY & Filosofov, NG 2017, 'Nanoscale Cu2O films: Radio-frequency magnetron sputtering and structural and optical studies', Semiconductors, vol. 51, no. 1, pp. 110-114. https://doi.org/10.1134/S1063782617010110

APA

Kudryashov, D. A., Gudovskikh, A. S., Babichev, A. V., Filimonov, V., Mozharov, A. M., Agekyan, V. F., Borisov, E. V., Serov, A. Y., & Filosofov, N. G. (2017). Nanoscale Cu2O films: Radio-frequency magnetron sputtering and structural and optical studies. Semiconductors, 51(1), 110-114. https://doi.org/10.1134/S1063782617010110

Vancouver

Kudryashov DA, Gudovskikh AS, Babichev AV, Filimonov V, Mozharov AM, Agekyan VF et al. Nanoscale Cu2O films: Radio-frequency magnetron sputtering and structural and optical studies. Semiconductors. 2017 Jan 1;51(1):110-114. https://doi.org/10.1134/S1063782617010110

Author

Kudryashov, D. A. ; Gudovskikh, A. S. ; Babichev, A. V. ; Filimonov, V. ; Mozharov, A. M. ; Agekyan, V. F. ; Borisov, E. V. ; Serov, A. Yu ; Filosofov, N. G. / Nanoscale Cu2O films : Radio-frequency magnetron sputtering and structural and optical studies. In: Semiconductors. 2017 ; Vol. 51, No. 1. pp. 110-114.

BibTeX

@article{8da99e15d55b45488d757f4bcb33157c,
title = "Nanoscale Cu2O films: Radio-frequency magnetron sputtering and structural and optical studies",
abstract = "Nanoscale copper (I) oxide layers are formed by magnetron-assisted sputtering onto glassy and silicon substrates in an oxygen-free environment at room temperature, and the structural and optical properties of the layers are studied. It is shown that copper oxide formed on a silicon substrate exhibits a lower degree of disorder than that formed on a glassy substrate, which is supported by the observation of a higher intensity and a smaller half-width of reflections in the diffraction pattern. The highest intensity of reflections in the diffraction pattern is observed for Cu2O films grown on silicon at a magnetron power of 150 W. The absorption and transmittance spectra of these Cu2O films are in agreement with the well-known spectra of bulk crystals. In the Raman spectra of the films, phonons inherent in the crystal lattice of cubic Cu2O crystals are identified.",
author = "Kudryashov, {D. A.} and Gudovskikh, {A. S.} and Babichev, {A. V.} and V. Filimonov and Mozharov, {A. M.} and Agekyan, {V. F.} and Borisov, {E. V.} and Serov, {A. Yu} and Filosofov, {N. G.}",
note = "Publisher Copyright: {\textcopyright} 2017, Pleiades Publishing, Ltd. Copyright: Copyright 2017 Elsevier B.V., All rights reserved.",
year = "2017",
month = jan,
day = "1",
doi = "10.1134/S1063782617010110",
language = "English",
volume = "51",
pages = "110--114",
journal = "Semiconductors",
issn = "1063-7826",
publisher = "МАИК {"}Наука/Интерпериодика{"}",
number = "1",

}

RIS

TY - JOUR

T1 - Nanoscale Cu2O films

T2 - Radio-frequency magnetron sputtering and structural and optical studies

AU - Kudryashov, D. A.

AU - Gudovskikh, A. S.

AU - Babichev, A. V.

AU - Filimonov, V.

AU - Mozharov, A. M.

AU - Agekyan, V. F.

AU - Borisov, E. V.

AU - Serov, A. Yu

AU - Filosofov, N. G.

N1 - Publisher Copyright: © 2017, Pleiades Publishing, Ltd. Copyright: Copyright 2017 Elsevier B.V., All rights reserved.

PY - 2017/1/1

Y1 - 2017/1/1

N2 - Nanoscale copper (I) oxide layers are formed by magnetron-assisted sputtering onto glassy and silicon substrates in an oxygen-free environment at room temperature, and the structural and optical properties of the layers are studied. It is shown that copper oxide formed on a silicon substrate exhibits a lower degree of disorder than that formed on a glassy substrate, which is supported by the observation of a higher intensity and a smaller half-width of reflections in the diffraction pattern. The highest intensity of reflections in the diffraction pattern is observed for Cu2O films grown on silicon at a magnetron power of 150 W. The absorption and transmittance spectra of these Cu2O films are in agreement with the well-known spectra of bulk crystals. In the Raman spectra of the films, phonons inherent in the crystal lattice of cubic Cu2O crystals are identified.

AB - Nanoscale copper (I) oxide layers are formed by magnetron-assisted sputtering onto glassy and silicon substrates in an oxygen-free environment at room temperature, and the structural and optical properties of the layers are studied. It is shown that copper oxide formed on a silicon substrate exhibits a lower degree of disorder than that formed on a glassy substrate, which is supported by the observation of a higher intensity and a smaller half-width of reflections in the diffraction pattern. The highest intensity of reflections in the diffraction pattern is observed for Cu2O films grown on silicon at a magnetron power of 150 W. The absorption and transmittance spectra of these Cu2O films are in agreement with the well-known spectra of bulk crystals. In the Raman spectra of the films, phonons inherent in the crystal lattice of cubic Cu2O crystals are identified.

UR - http://www.scopus.com/inward/record.url?scp=85011982259&partnerID=8YFLogxK

U2 - 10.1134/S1063782617010110

DO - 10.1134/S1063782617010110

M3 - Article

AN - SCOPUS:85011982259

VL - 51

SP - 110

EP - 114

JO - Semiconductors

JF - Semiconductors

SN - 1063-7826

IS - 1

ER -

ID: 9324751