Structures of Si(001) hydrophilically bonded wafers have been studied by transmission electron microscopy. A model of three-fold nod generation during interaction of intersecting mixed and screw dislocations has been suggested and applied to analyze geometrical features of dislocation networks. Possible mechanisms of dislocation generation at the interface between Si bonded wafers are discussed. © (2011) Trans Tech Publications, Switzerland.
Original languageEnglish
Pages (from-to)253-258
JournalDiffusion and Defect Data Pt.B: Solid State Phenomena
Volume178-179
DOIs
StatePublished - 2011

    Research areas

  • Dislocation reactions, Screw dislocations, Silicon wafer bonding, Transmission electron microscopy

ID: 5206363