Research output: Contribution to journal › Article › peer-review
Low-energy electron mean free path in thin films of copper phthalocyanine. / Komolov, SA; Lazneva, EF; Komolov, AS.
In: Technical Physics Letters, Vol. 29, No. 12, 2003, p. 974-976.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Low-energy electron mean free path in thin films of copper phthalocyanine
AU - Komolov, SA
AU - Lazneva, EF
AU - Komolov, AS
PY - 2003
Y1 - 2003
N2 - The formation of thin organic films of copper phthalocyanine (CuPc) deposited onto the surface of gold-coated quartz crystal resonator was studied in situ under ultrahigh vacuum conditions by means of total electron-beam-induced current spectroscopy in combination with deposit thickness determination by piezocrystal microbalance technique. Variations in the fine structure of the total current spectra of CuPc layers of various thicknesses in the 0-8 nm interval have been analyzed and the electron mean free path in thin CuPc films was determined as a function of the electron energy. For electron energies of 5.0, 7.2, 14.4, and 18.0 eV above the Fermi level, the mean free path is 6.4, 3.9, 2.6, and 2.3 nm. (C) 2003 MAIK "Nauka / Interperiodica".
AB - The formation of thin organic films of copper phthalocyanine (CuPc) deposited onto the surface of gold-coated quartz crystal resonator was studied in situ under ultrahigh vacuum conditions by means of total electron-beam-induced current spectroscopy in combination with deposit thickness determination by piezocrystal microbalance technique. Variations in the fine structure of the total current spectra of CuPc layers of various thicknesses in the 0-8 nm interval have been analyzed and the electron mean free path in thin CuPc films was determined as a function of the electron energy. For electron energies of 5.0, 7.2, 14.4, and 18.0 eV above the Fermi level, the mean free path is 6.4, 3.9, 2.6, and 2.3 nm. (C) 2003 MAIK "Nauka / Interperiodica".
KW - INTERFACE FORMATION
KW - SURFACES
M3 - статья
VL - 29
SP - 974
EP - 976
JO - Technical Physics Letters
JF - Technical Physics Letters
SN - 1063-7850
IS - 12
ER -
ID: 18881535