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Key methods for intensifying soft X-ray emission from a laser plasma for lithography. / Andreev, A. A.; Nikolaev, V. G.; Platonov, K. Yu; Kurakin, Yu A.

In: Technical Physics, Vol. 52, No. 6, 06.2007, p. 739-746.

Research output: Contribution to journalArticlepeer-review

Harvard

Andreev, AA, Nikolaev, VG, Platonov, KY & Kurakin, YA 2007, 'Key methods for intensifying soft X-ray emission from a laser plasma for lithography', Technical Physics, vol. 52, no. 6, pp. 739-746. https://doi.org/10.1134/S1063784207060102

APA

Andreev, A. A., Nikolaev, V. G., Platonov, K. Y., & Kurakin, Y. A. (2007). Key methods for intensifying soft X-ray emission from a laser plasma for lithography. Technical Physics, 52(6), 739-746. https://doi.org/10.1134/S1063784207060102

Vancouver

Author

Andreev, A. A. ; Nikolaev, V. G. ; Platonov, K. Yu ; Kurakin, Yu A. / Key methods for intensifying soft X-ray emission from a laser plasma for lithography. In: Technical Physics. 2007 ; Vol. 52, No. 6. pp. 739-746.

BibTeX

@article{930347cad5b04e99ab00bf1f1b6d18fb,
title = "Key methods for intensifying soft X-ray emission from a laser plasma for lithography",
abstract = "A two-pulse two-wave (Nd and CO2 lasers) scheme is proposed for irradiating a laser target, which ensures the highest factor of laser radiation conversion to the X-ray range (13.5 nm ± 1%). Analytic estimates are obtained for parameters of pulses and of the target made of Xe or Li. Numerical optimization is performed for X-ray emission from a spherical Xe target exposed to a CO2 laser pulse. The maximal factor of conversion of laser radiation to X rays is ∼1%. Angular and spectral characteristics of X-ray radiation are obtained. The flux of fast Xe ions ejected from the target and damaging the Mo/Si coating of X-ray mirrors is estimated.",
author = "Andreev, {A. A.} and Nikolaev, {V. G.} and Platonov, {K. Yu} and Kurakin, {Yu A.}",
note = "Funding Information: ACKNOWLEDGMENTS This study was supported by the International Science and Engineering Center, project no. 0991.",
year = "2007",
month = jun,
doi = "10.1134/S1063784207060102",
language = "English",
volume = "52",
pages = "739--746",
journal = "Technical Physics",
issn = "1063-7842",
publisher = "Pleiades Publishing",
number = "6",

}

RIS

TY - JOUR

T1 - Key methods for intensifying soft X-ray emission from a laser plasma for lithography

AU - Andreev, A. A.

AU - Nikolaev, V. G.

AU - Platonov, K. Yu

AU - Kurakin, Yu A.

N1 - Funding Information: ACKNOWLEDGMENTS This study was supported by the International Science and Engineering Center, project no. 0991.

PY - 2007/6

Y1 - 2007/6

N2 - A two-pulse two-wave (Nd and CO2 lasers) scheme is proposed for irradiating a laser target, which ensures the highest factor of laser radiation conversion to the X-ray range (13.5 nm ± 1%). Analytic estimates are obtained for parameters of pulses and of the target made of Xe or Li. Numerical optimization is performed for X-ray emission from a spherical Xe target exposed to a CO2 laser pulse. The maximal factor of conversion of laser radiation to X rays is ∼1%. Angular and spectral characteristics of X-ray radiation are obtained. The flux of fast Xe ions ejected from the target and damaging the Mo/Si coating of X-ray mirrors is estimated.

AB - A two-pulse two-wave (Nd and CO2 lasers) scheme is proposed for irradiating a laser target, which ensures the highest factor of laser radiation conversion to the X-ray range (13.5 nm ± 1%). Analytic estimates are obtained for parameters of pulses and of the target made of Xe or Li. Numerical optimization is performed for X-ray emission from a spherical Xe target exposed to a CO2 laser pulse. The maximal factor of conversion of laser radiation to X rays is ∼1%. Angular and spectral characteristics of X-ray radiation are obtained. The flux of fast Xe ions ejected from the target and damaging the Mo/Si coating of X-ray mirrors is estimated.

UR - http://www.scopus.com/inward/record.url?scp=34547316317&partnerID=8YFLogxK

U2 - 10.1134/S1063784207060102

DO - 10.1134/S1063784207060102

M3 - Article

AN - SCOPUS:34547316317

VL - 52

SP - 739

EP - 746

JO - Technical Physics

JF - Technical Physics

SN - 1063-7842

IS - 6

ER -

ID: 85666897