Research output: Contribution to journal › Article › peer-review
Ionization kinetics and E-H mode transition in a noble gas, low-pressure pulsed ICP discharge. / Demidov, V. I.; Dejoseph, C. A.; Kudryavtsev, A. A.
In: Plasma Sources Science and Technology, Vol. 13, No. 4, 01.11.2004, p. 600-603.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Ionization kinetics and E-H mode transition in a noble gas, low-pressure pulsed ICP discharge
AU - Demidov, V. I.
AU - Dejoseph, C. A.
AU - Kudryavtsev, A. A.
PY - 2004/11/1
Y1 - 2004/11/1
N2 - Under some conditions of power modulation, an rf ICP will exhibit a rapid transition between E and H modes following application of the rf power. It is shown that in noble gases this transition may be connected with the dynamics of the electron density and metastable density of the atoms, and competition between direct and stepwise ionization of the atoms by electron impact. A simple model allows us to demonstrate that after application of rf power the initial slow growth of electron density changes to a rapidly rising function. This rapid rise is consistent with observed E-H transitions that take place in these discharges. The model thus allows us to calculate the characteristic time for the transition beteween modes.
AB - Under some conditions of power modulation, an rf ICP will exhibit a rapid transition between E and H modes following application of the rf power. It is shown that in noble gases this transition may be connected with the dynamics of the electron density and metastable density of the atoms, and competition between direct and stepwise ionization of the atoms by electron impact. A simple model allows us to demonstrate that after application of rf power the initial slow growth of electron density changes to a rapidly rising function. This rapid rise is consistent with observed E-H transitions that take place in these discharges. The model thus allows us to calculate the characteristic time for the transition beteween modes.
UR - http://www.scopus.com/inward/record.url?scp=9944233588&partnerID=8YFLogxK
U2 - 10.1088/0963-0252/13/4/008
DO - 10.1088/0963-0252/13/4/008
M3 - Article
AN - SCOPUS:9944233588
VL - 13
SP - 600
EP - 603
JO - Plasma Sources Science and Technology
JF - Plasma Sources Science and Technology
SN - 0963-0252
IS - 4
ER -
ID: 52198797