Research output: Contribution to journal › Conference article › peer-review
Heteroepitaxial growth of SiC films by carbonization of polyimide Langmuir-Blodgett films on Si. / Goloudina, S. I.; Luchinin, V. V.; Pasyuta, V. M.; Panov, M. F.; Smirnov, A. N.; Kirilenko, D. A.; Semenova, T. F.; Sklizkova, V. P.; Gofman, I. V.; Svetlychnyi, V. M.; Kudryavtsev, V. V.
In: MATEC Web of Conferences, Vol. 98, 04002, 08.02.2017.Research output: Contribution to journal › Conference article › peer-review
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TY - JOUR
T1 - Heteroepitaxial growth of SiC films by carbonization of polyimide Langmuir-Blodgett films on Si
AU - Goloudina, S. I.
AU - Luchinin, V. V.
AU - Pasyuta, V. M.
AU - Panov, M. F.
AU - Smirnov, A. N.
AU - Kirilenko, D. A.
AU - Semenova, T. F.
AU - Sklizkova, V. P.
AU - Gofman, I. V.
AU - Svetlychnyi, V. M.
AU - Kudryavtsev, V. V.
PY - 2017/2/8
Y1 - 2017/2/8
N2 - High quality single crystal SiC films were prepared by carbonization of polyimide Langmuir-Blodgett films on Si substrate. The films formed after annealing of the polyimide films at 1000°C, 1100°C, 1200°C were studied by Fourier transform-infrared (FTIR) spectroscopy, X-ray diffraction (XRD), Raman spectroscopy, transmission electon microscopy (TEM), transmission electron diffraction (TED), and scanning electron microscopy (SEM). XRD study and HRTEM cross-section revealed that the crystalline SiC film begins to grow on Si (111) substrate at 1000°C. According to the HRTEM cross-section image five planes in 3C-SiC (111) film are aligned with four Si(111) planes at the SiC/Si interface. It was shown the SiC films (35 nm) grown on Si(111) at 1200°C have mainly cubic 3C-SiC structure with a little presence of hexagonal polytypes. Only 3C-SiC films (30 nm) were formed on Si (100) substrate at the same temperature. It was shown the SiC films (30-35 nm) are able to cover the voids in Si substrate with size up to 10 μm.
AB - High quality single crystal SiC films were prepared by carbonization of polyimide Langmuir-Blodgett films on Si substrate. The films formed after annealing of the polyimide films at 1000°C, 1100°C, 1200°C were studied by Fourier transform-infrared (FTIR) spectroscopy, X-ray diffraction (XRD), Raman spectroscopy, transmission electon microscopy (TEM), transmission electron diffraction (TED), and scanning electron microscopy (SEM). XRD study and HRTEM cross-section revealed that the crystalline SiC film begins to grow on Si (111) substrate at 1000°C. According to the HRTEM cross-section image five planes in 3C-SiC (111) film are aligned with four Si(111) planes at the SiC/Si interface. It was shown the SiC films (35 nm) grown on Si(111) at 1200°C have mainly cubic 3C-SiC structure with a little presence of hexagonal polytypes. Only 3C-SiC films (30 nm) were formed on Si (100) substrate at the same temperature. It was shown the SiC films (30-35 nm) are able to cover the voids in Si substrate with size up to 10 μm.
UR - http://www.scopus.com/inward/record.url?scp=85013377947&partnerID=8YFLogxK
U2 - 10.1051/matecconf/20179804002
DO - 10.1051/matecconf/20179804002
M3 - Conference article
AN - SCOPUS:85013377947
VL - 98
JO - MATEC Web of Conferences
JF - MATEC Web of Conferences
SN - 2261-236X
M1 - 04002
T2 - 16th International Conference on Organized Molecular Films, ICOMF-LB 2016
Y2 - 25 July 2016 through 29 July 2016
ER -
ID: 50023251