Evolution of surface morphology at the early stage of Al2O3 film growth on a rough substrate

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Evolution of surface morphology at the early stage of Al2O3 film growth on a rough substrate. / Filatova, E. O.; Peverini, L.; Ziegler, E.; Kozhevnikov, I. V.; Jonnard, P.; Andre, J. M.

In: Journal of Physics: Condensed Matter, Vol. 22, No. 34, 03.08.2010, p. 345003_1-8.

Research output: Contribution to journal › Article › peer-review

Author

Filatova, E. O. ; Peverini, L. ; Ziegler, E. ; Kozhevnikov, I. V. ; Jonnard, P. ; Andre, J. M. / Evolution of surface morphology at the early stage of Al2O3 film growth on a rough substrate. In: Journal of Physics: Condensed Matter. 2010 ; Vol. 22, No. 34. pp. 345003_1-8.

BibTeX

@article{1ce0cfe0628f4669938d4934f72ed88d,

title = "Evolution of surface morphology at the early stage of Al2O3 film growth on a rough substrate",

abstract = "We present an experimental study of the evolution of the surface of a growing film as a function of the statistical parameters of the virgin substrate roughness. The growth of sputter-deposited Al2O3 films onto Si substrates was followed in situ using an x-ray scattering technique. Despite the use of substrates presenting different roughness correlation length and cristallographie orientation, the evolution of the film roughness is demonstrated to obey the same scaling law, i.e., with the same static and dynamic exponents. Approaches to accurately determine the scaling exponents from x-ray scattering data are discussed. {\textcopyright} 2010 IOP Publishing Ltd.",

author = "Filatova, {E. O.} and L. Peverini and E. Ziegler and Kozhevnikov, {I. V.} and P. Jonnard and Andre, {J. M.}",

year = "2010",

month = aug,

day = "3",

doi = "10.1088/0953-8984/22/34/345003",

language = "English",

volume = "22",

pages = "345003_1--8",

journal = "Journal of Physics Condensed Matter",

issn = "0953-8984",

publisher = "IOP Publishing Ltd.",

number = "34",

}

RIS

TY - JOUR

T1 - Evolution of surface morphology at the early stage of Al2O3 film growth on a rough substrate

AU - Filatova, E. O.

AU - Peverini, L.

AU - Ziegler, E.

AU - Kozhevnikov, I. V.

AU - Jonnard, P.

AU - Andre, J. M.

PY - 2010/8/3

Y1 - 2010/8/3

N2 - We present an experimental study of the evolution of the surface of a growing film as a function of the statistical parameters of the virgin substrate roughness. The growth of sputter-deposited Al2O3 films onto Si substrates was followed in situ using an x-ray scattering technique. Despite the use of substrates presenting different roughness correlation length and cristallographie orientation, the evolution of the film roughness is demonstrated to obey the same scaling law, i.e., with the same static and dynamic exponents. Approaches to accurately determine the scaling exponents from x-ray scattering data are discussed. © 2010 IOP Publishing Ltd.

AB - We present an experimental study of the evolution of the surface of a growing film as a function of the statistical parameters of the virgin substrate roughness. The growth of sputter-deposited Al2O3 films onto Si substrates was followed in situ using an x-ray scattering technique. Despite the use of substrates presenting different roughness correlation length and cristallographie orientation, the evolution of the film roughness is demonstrated to obey the same scaling law, i.e., with the same static and dynamic exponents. Approaches to accurately determine the scaling exponents from x-ray scattering data are discussed. © 2010 IOP Publishing Ltd.

UR - http://www.scopus.com/inward/record.url?scp=77956997368&partnerID=8YFLogxK

U2 - 10.1088/0953-8984/22/34/345003

DO - 10.1088/0953-8984/22/34/345003

M3 - Article

VL - 22

SP - 345003_1-8

JO - Journal of Physics Condensed Matter

JF - Journal of Physics Condensed Matter

SN - 0953-8984

IS - 34

ER -

ID: 5219206