Research output: Contribution to journal › Article › peer-review
Evolution of surface morphology at the early stage of Al2O3 film growth on a rough substrate. / Filatova, E. O.; Peverini, L.; Ziegler, E.; Kozhevnikov, I. V.; Jonnard, P.; Andre, J. M.
In: Journal of Physics: Condensed Matter, Vol. 22, No. 34, 03.08.2010, p. 345003_1-8.Research output: Contribution to journal › Article › peer-review
}
TY - JOUR
T1 - Evolution of surface morphology at the early stage of Al2O3 film growth on a rough substrate
AU - Filatova, E. O.
AU - Peverini, L.
AU - Ziegler, E.
AU - Kozhevnikov, I. V.
AU - Jonnard, P.
AU - Andre, J. M.
PY - 2010/8/3
Y1 - 2010/8/3
N2 - We present an experimental study of the evolution of the surface of a growing film as a function of the statistical parameters of the virgin substrate roughness. The growth of sputter-deposited Al2O3 films onto Si substrates was followed in situ using an x-ray scattering technique. Despite the use of substrates presenting different roughness correlation length and cristallographie orientation, the evolution of the film roughness is demonstrated to obey the same scaling law, i.e., with the same static and dynamic exponents. Approaches to accurately determine the scaling exponents from x-ray scattering data are discussed. © 2010 IOP Publishing Ltd.
AB - We present an experimental study of the evolution of the surface of a growing film as a function of the statistical parameters of the virgin substrate roughness. The growth of sputter-deposited Al2O3 films onto Si substrates was followed in situ using an x-ray scattering technique. Despite the use of substrates presenting different roughness correlation length and cristallographie orientation, the evolution of the film roughness is demonstrated to obey the same scaling law, i.e., with the same static and dynamic exponents. Approaches to accurately determine the scaling exponents from x-ray scattering data are discussed. © 2010 IOP Publishing Ltd.
UR - http://www.scopus.com/inward/record.url?scp=77956997368&partnerID=8YFLogxK
U2 - 10.1088/0953-8984/22/34/345003
DO - 10.1088/0953-8984/22/34/345003
M3 - Article
VL - 22
SP - 345003_1-8
JO - Journal of Physics Condensed Matter
JF - Journal of Physics Condensed Matter
SN - 0953-8984
IS - 34
ER -
ID: 5219206