Research output: Contribution to journal › Article › peer-review
Electronic charge distribution at interfaces between Cu-phthalocyanine films and semiconductor surfaces. / Komolov, AS; Moller, PJ.
In: Surface Science, Vol. 532, 10.06.2003, p. 1004-1010.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Electronic charge distribution at interfaces between Cu-phthalocyanine films and semiconductor surfaces
AU - Komolov, AS
AU - Moller, PJ
PY - 2003/6/10
Y1 - 2003/6/10
N2 - Total current electron spectroscopy (TCS) that uses a probing beam of low energy electrons was applied to study electronic charge transfer at interfaces between Cu-phthalocyanine (CuPc) films thermally deposited in situ onto ZnO, oxidized and crystalline silicon substrates. Analysis of the TCS data provided us also with new data on the density of unoccupied electron states (DOUS) of the CuPc films at 0-25 eV above E-F. A most significant electronic charge transfer from the CuPc film to SiO2/n-Si and n-Si(1 0 0) was observed and the polarization layer extended up to 10 nm into the CuPc film bulk. the electronic structure of the CuPc molecules on n-Si(1 0 0) and on ZnO(0 0 0 1) was perturbed within 1-2 nm of the deposit due to interaction with the substrates. Admission of O-2 and NO2 at 10(-5) Pa and 300 K resulted in a reversible decrease and increase of the film surface potential, respectively. Formation of TC peaks related to O-orbitals on the gas adsorption on the CuPc surface was also registered. (C) 2003 Elsevier Science B.V. All rights reserved.
AB - Total current electron spectroscopy (TCS) that uses a probing beam of low energy electrons was applied to study electronic charge transfer at interfaces between Cu-phthalocyanine (CuPc) films thermally deposited in situ onto ZnO, oxidized and crystalline silicon substrates. Analysis of the TCS data provided us also with new data on the density of unoccupied electron states (DOUS) of the CuPc films at 0-25 eV above E-F. A most significant electronic charge transfer from the CuPc film to SiO2/n-Si and n-Si(1 0 0) was observed and the polarization layer extended up to 10 nm into the CuPc film bulk. the electronic structure of the CuPc molecules on n-Si(1 0 0) and on ZnO(0 0 0 1) was perturbed within 1-2 nm of the deposit due to interaction with the substrates. Admission of O-2 and NO2 at 10(-5) Pa and 300 K resulted in a reversible decrease and increase of the film surface potential, respectively. Formation of TC peaks related to O-orbitals on the gas adsorption on the CuPc surface was also registered. (C) 2003 Elsevier Science B.V. All rights reserved.
KW - surface electronic phenomena (work function
KW - surface potential, surface states, etc.)
KW - electron-solid scattering and transmission - elastic
KW - surface chemical reaction
KW - semiconductor-semiconductor interfaces
KW - silicon
KW - silicon oxides
KW - zinc oxide
KW - COPPER-PHTHALOCYANINE
KW - SPECTROSCOPY
KW - MOLECULES
KW - METAL
KW - ADSORPTION
KW - ALIGNMENT
KW - DEVICES
KW - LAYERS
KW - ENERGY
U2 - 10.1016/S0039-6028(03)00459-X
DO - 10.1016/S0039-6028(03)00459-X
M3 - статья
VL - 532
SP - 1004
EP - 1010
JO - Surface Science
JF - Surface Science
SN - 0039-6028
Y2 - 24 June 2002 through 28 June 2002
ER -
ID: 18881433