Electron stochastic heating in a capacitively coupled low-pressure argon rf-discharge.

Research output: Contribution to journal › Article

Original language	Undefined
Pages (from-to)	025026_1-6
Journal	Plasma Sources Science and Technology
Volume	18
Issue number	2
DOIs	https://doi.org/DOI: 10.1088/0963-0252/18/2/025026
State	Published - 2009

ID: 5197449