TY - GEN

T1 - Electrochemical activity of lithium nickel oxide thin-film cathodes obtained by ALD

AU - Mitrofanov, Ilya

AU - Koshtyal, Yury

AU - Nazarov, Denis

AU - Ezhov, Ilya

AU - Kim, Artem

AU - Rumyantsev, Aleksander

AU - Medvedev, Oleg

AU - Lyutakov, Oleksiy

AU - Popovich, Anatoliy

AU - Maximov, Maxim

PY - 2021/1/1

Y1 - 2021/1/1

N2 - Energy density is one of the essential characteristics of thin-film power sources which provides the duration of the autonomous performance of sensors, energy harvesters, IoT devices, etc. The Atomic layer deposition (ALD) allows the growth of conformal coatings with a controlled composition on high aspect ratio substrates and can be used to manufacture some components of thin-film batteries. Modern high energy active cathode materials include Li, transition metal, and oxygen. The production of such films by the ALD method can be carried out using a linear combination of lithium oxide structures and transition metal oxide structures (supercycle approach), followed by annealing. The control of the composition and properties of the films can be achieved by varying the ratio of cycles conducted for deposition of binary oxides during supercycle. In present work, were used 1/10 and 1/30 ratio of lithium oxide/nickel oxide ALD cycles during supercycle to obtain thin films of Li-Ni-O system. X-ray photoelectron spectroscopy of the as-deposited films demonstrates low nickel content in films. The annealed films at 800 and 900 °C for 10 minutes show the presence of the lithium silicates and nickel silicide phases. It was found that the best electrochemical performance show samples of LNO 1/30 series annealed at 800 °C: at a discharge current of 20 μA (5C), the capacity was equal to 35 μA·h·μm-1·cm-2. The obtained results demonstrate a low effect of an increase in the number of cycles on the proportion of nickel in the films and, consequently, on the electrochemical characteristics.

AB - Energy density is one of the essential characteristics of thin-film power sources which provides the duration of the autonomous performance of sensors, energy harvesters, IoT devices, etc. The Atomic layer deposition (ALD) allows the growth of conformal coatings with a controlled composition on high aspect ratio substrates and can be used to manufacture some components of thin-film batteries. Modern high energy active cathode materials include Li, transition metal, and oxygen. The production of such films by the ALD method can be carried out using a linear combination of lithium oxide structures and transition metal oxide structures (supercycle approach), followed by annealing. The control of the composition and properties of the films can be achieved by varying the ratio of cycles conducted for deposition of binary oxides during supercycle. In present work, were used 1/10 and 1/30 ratio of lithium oxide/nickel oxide ALD cycles during supercycle to obtain thin films of Li-Ni-O system. X-ray photoelectron spectroscopy of the as-deposited films demonstrates low nickel content in films. The annealed films at 800 and 900 °C for 10 minutes show the presence of the lithium silicates and nickel silicide phases. It was found that the best electrochemical performance show samples of LNO 1/30 series annealed at 800 °C: at a discharge current of 20 μA (5C), the capacity was equal to 35 μA·h·μm-1·cm-2. The obtained results demonstrate a low effect of an increase in the number of cycles on the proportion of nickel in the films and, consequently, on the electrochemical characteristics.

KW - Atomic layer deposition

KW - Li-ion batteries

KW - Lithium nickel oxide

KW - Thin films

UR - http://www.scopus.com/inward/record.url?scp=85106050680&partnerID=8YFLogxK

U2 - 10.37904/nanocon.2020.3718

DO - 10.37904/nanocon.2020.3718

M3 - Conference contribution

AN - SCOPUS:85106050680

SN - 978-80-87294-98-7

T3 - NANOCON Conference Proceedings - International Conference on Nanomaterials

SP - 202

EP - 207

BT - Proceedings 12th International Conference on Nanomaterials - Research & Application

ER -