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Efficient soft x-ray emission source at 13.5 nm by use of a femtosecond-laser-produced Li-based microplasma. / Higashiguchi, Takeshi; Rajyaguru, Chirag; Kubodera, Shoichi; Sasaki, Wataru; Yugami, Noboru; Kikuchi, Takashi; Kawata, Shigeo; Andreev, Alex.

In: Applied Physics Letters, Vol. 86, No. 23, 231502, 06.06.2005, p. 1-3.

Research output: Contribution to journal › Article › peer-review

Harvard

Higashiguchi, T, Rajyaguru, C, Kubodera, S, Sasaki, W, Yugami, N, Kikuchi, T, Kawata, S & Andreev, A 2005, 'Efficient soft x-ray emission source at 13.5 nm by use of a femtosecond-laser-produced Li-based microplasma', Applied Physics Letters, vol. 86, no. 23, 231502, pp. 1-3. https://doi.org/10.1063/1.1947890

APA

Higashiguchi, T., Rajyaguru, C., Kubodera, S., Sasaki, W., Yugami, N., Kikuchi, T., Kawata, S., & Andreev, A. (2005). Efficient soft x-ray emission source at 13.5 nm by use of a femtosecond-laser-produced Li-based microplasma. Applied Physics Letters, 86(23), 1-3. [231502]. https://doi.org/10.1063/1.1947890

Vancouver

Higashiguchi T, Rajyaguru C, Kubodera S, Sasaki W, Yugami N, Kikuchi T et al. Efficient soft x-ray emission source at 13.5 nm by use of a femtosecond-laser-produced Li-based microplasma. Applied Physics Letters. 2005 Jun 6;86(23):1-3. 231502. https://doi.org/10.1063/1.1947890

Author

Higashiguchi, Takeshi ; Rajyaguru, Chirag ; Kubodera, Shoichi ; Sasaki, Wataru ; Yugami, Noboru ; Kikuchi, Takashi ; Kawata, Shigeo ; Andreev, Alex. / Efficient soft x-ray emission source at 13.5 nm by use of a femtosecond-laser-produced Li-based microplasma. In: Applied Physics Letters. 2005 ; Vol. 86, No. 23. pp. 1-3.

BibTeX

@article{9e934c80ad1e4b9e824d16b5698b251b,
title = "Efficient soft x-ray emission source at 13.5 nm by use of a femtosecond-laser-produced Li-based microplasma",
abstract = "A proof-of-principle experiment was demonstrated to optimize a Li-based microjet target coupled to dual subpicosecond laser pulses as a 13.5 nm soft x-ray emission source. An optimum pulse duration of 450 fs to achieve a maximum emission at 13.5 nm was well explained by the resonant absorption process. Utilization of dual femtosecond pulses revealed that the optimum pulse separation around 500 ps was necessary to achieve a maximum soft x-ray conversion efficiency of 0.2%, where plasma hydrodynamics could not be neglected. A one-fluid two-temperature hydrodynamic simulation reproduced this optimum pulse separation behavior.",
author = "Takeshi Higashiguchi and Chirag Rajyaguru and Shoichi Kubodera and Wataru Sasaki and Noboru Yugami and Takashi Kikuchi and Shigeo Kawata and Alex Andreev",
note = "Funding Information: The authors are grateful to M. Koga, K. Kawasaki, N. Dojyo, and M. Hamada for their technical support. The authors are also grateful to K. Higashiguchi (Department of Life Sciences, Graduate School of Arts and Sciences, University of Tokyo) for technical support about the aqueous solution target. A part of this work was performed under the auspices of MEXT (Ministry of Education, Culture, Science, and Technology, Japan) under contract subject ”Leading project for EUV lithography source development”. The authors acknowledge support from the Ministry of Economy and Trading Industry (METI) of Japan. They also acknowledge the support from Miyazaki prefecture. One of the authors (T.H.) also acknowledges support from the Saneyoshi Scholarship Foundation. ",
year = "2005",
month = jun,
day = "6",
doi = "10.1063/1.1947890",
language = "English",
volume = "86",
pages = "1--3",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics",
number = "23",

}

RIS

TY - JOUR

T1 - Efficient soft x-ray emission source at 13.5 nm by use of a femtosecond-laser-produced Li-based microplasma

AU - Higashiguchi, Takeshi

AU - Rajyaguru, Chirag

AU - Kubodera, Shoichi

AU - Sasaki, Wataru

AU - Yugami, Noboru

AU - Kikuchi, Takashi

AU - Kawata, Shigeo

AU - Andreev, Alex

N1 - Funding Information: The authors are grateful to M. Koga, K. Kawasaki, N. Dojyo, and M. Hamada for their technical support. The authors are also grateful to K. Higashiguchi (Department of Life Sciences, Graduate School of Arts and Sciences, University of Tokyo) for technical support about the aqueous solution target. A part of this work was performed under the auspices of MEXT (Ministry of Education, Culture, Science, and Technology, Japan) under contract subject ”Leading project for EUV lithography source development”. The authors acknowledge support from the Ministry of Economy and Trading Industry (METI) of Japan. They also acknowledge the support from Miyazaki prefecture. One of the authors (T.H.) also acknowledges support from the Saneyoshi Scholarship Foundation.

PY - 2005/6/6

Y1 - 2005/6/6

N2 - A proof-of-principle experiment was demonstrated to optimize a Li-based microjet target coupled to dual subpicosecond laser pulses as a 13.5 nm soft x-ray emission source. An optimum pulse duration of 450 fs to achieve a maximum emission at 13.5 nm was well explained by the resonant absorption process. Utilization of dual femtosecond pulses revealed that the optimum pulse separation around 500 ps was necessary to achieve a maximum soft x-ray conversion efficiency of 0.2%, where plasma hydrodynamics could not be neglected. A one-fluid two-temperature hydrodynamic simulation reproduced this optimum pulse separation behavior.

AB - A proof-of-principle experiment was demonstrated to optimize a Li-based microjet target coupled to dual subpicosecond laser pulses as a 13.5 nm soft x-ray emission source. An optimum pulse duration of 450 fs to achieve a maximum emission at 13.5 nm was well explained by the resonant absorption process. Utilization of dual femtosecond pulses revealed that the optimum pulse separation around 500 ps was necessary to achieve a maximum soft x-ray conversion efficiency of 0.2%, where plasma hydrodynamics could not be neglected. A one-fluid two-temperature hydrodynamic simulation reproduced this optimum pulse separation behavior.

UR - http://www.scopus.com/inward/record.url?scp=21244449204&partnerID=8YFLogxK

U2 - 10.1063/1.1947890

DO - 10.1063/1.1947890

M3 - Article

AN - SCOPUS:21244449204

VL - 86

SP - 1

EP - 3

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 23

M1 - 231502

ER -

ID: 85670398