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Double relativistic electron accelerating mirror. / Andreev, Alexander; Platonov, Konstantin; Sadykova, Saltanat.

In: Applied Sciences (Switzerland), Vol. 3, No. 1, 01.03.2013, p. 94-106.

Research output: Contribution to journal › Article › peer-review

Harvard

Andreev, A, Platonov, K & Sadykova, S 2013, 'Double relativistic electron accelerating mirror', Applied Sciences (Switzerland), vol. 3, no. 1, pp. 94-106. https://doi.org/10.3390/app301940094

APA

Andreev, A., Platonov, K., & Sadykova, S. (2013). Double relativistic electron accelerating mirror. Applied Sciences (Switzerland), 3(1), 94-106. https://doi.org/10.3390/app301940094

Vancouver

Andreev A, Platonov K, Sadykova S. Double relativistic electron accelerating mirror. Applied Sciences (Switzerland). 2013 Mar 1;3(1):94-106. https://doi.org/10.3390/app301940094

Author

Andreev, Alexander ; Platonov, Konstantin ; Sadykova, Saltanat. / Double relativistic electron accelerating mirror. In: Applied Sciences (Switzerland). 2013 ; Vol. 3, No. 1. pp. 94-106.

BibTeX

@article{1f77d082080a495e90efa8281643c8ab,
title = "Double relativistic electron accelerating mirror",
abstract = "In the present paper, the possibility of generation of thin dense relativistic electron layers is shown using the analytical and numerical modeling of laser pulse interaction with ultra-thin layers. It was shown that the maximum electron energy can be gained by optimal tuning between the target width, intensity and laser pulse duration. The optimal parameters were obtained from a self-consistent system of Maxwell equations and the equation of motion of electron layer. For thin relativistic electron layers, the gaining of maximum electron energies requires a second additional overdense plasma layer, thus cutting the laser radiation off the plasma screen at the instant of gaining the maximum energy (DREAM-schema).",
keywords = "Acceleration, Laser, Relativistic electron mirror, Ultra-thin plasma layers",
author = "Alexander Andreev and Konstantin Platonov and Saltanat Sadykova",
note = "Publisher Copyright: {\textcopyright} 2012 by the authors.",
year = "2013",
month = mar,
day = "1",
doi = "10.3390/app301940094",
language = "English",
volume = "3",
pages = "94--106",
journal = "Applied Sciences (Switzerland)",
issn = "2076-3417",
publisher = "MDPI AG",
number = "1",

}

RIS

TY - JOUR

T1 - Double relativistic electron accelerating mirror

AU - Andreev, Alexander

AU - Platonov, Konstantin

AU - Sadykova, Saltanat

N1 - Publisher Copyright: © 2012 by the authors.

PY - 2013/3/1

Y1 - 2013/3/1

N2 - In the present paper, the possibility of generation of thin dense relativistic electron layers is shown using the analytical and numerical modeling of laser pulse interaction with ultra-thin layers. It was shown that the maximum electron energy can be gained by optimal tuning between the target width, intensity and laser pulse duration. The optimal parameters were obtained from a self-consistent system of Maxwell equations and the equation of motion of electron layer. For thin relativistic electron layers, the gaining of maximum electron energies requires a second additional overdense plasma layer, thus cutting the laser radiation off the plasma screen at the instant of gaining the maximum energy (DREAM-schema).

AB - In the present paper, the possibility of generation of thin dense relativistic electron layers is shown using the analytical and numerical modeling of laser pulse interaction with ultra-thin layers. It was shown that the maximum electron energy can be gained by optimal tuning between the target width, intensity and laser pulse duration. The optimal parameters were obtained from a self-consistent system of Maxwell equations and the equation of motion of electron layer. For thin relativistic electron layers, the gaining of maximum electron energies requires a second additional overdense plasma layer, thus cutting the laser radiation off the plasma screen at the instant of gaining the maximum energy (DREAM-schema).

KW - Acceleration

KW - Laser

KW - Relativistic electron mirror

KW - Ultra-thin plasma layers

UR - http://www.scopus.com/inward/record.url?scp=84880718619&partnerID=8YFLogxK

U2 - 10.3390/app301940094

DO - 10.3390/app301940094

M3 - Article

AN - SCOPUS:84880718619

VL - 3

SP - 94

EP - 106

JO - Applied Sciences (Switzerland)

JF - Applied Sciences (Switzerland)

SN - 2076-3417

IS - 1

ER -

ID: 85660989