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Angle resolved photoelectron spectroscopy as applied to X-ray mirrors: an in depth study of Mo/ Si multilayer systems. / Sakhonenkov, Sergei ; Filatova, Elena O. ; Gaisin, Aidar U. ; Kasatikov, Sergey A.; Konashuk, Aleksei S.; Pleshkov, Roman S.; Chkhalo, Nikolai I. .

In: Physical Chemistry Chemical Physics, 07.11.2019.

Research output: Contribution to journal › Article › peer-review

Harvard

Sakhonenkov, S, Filatova, EO, Gaisin, AU, Kasatikov, SA, Konashuk, AS, Pleshkov, RS & Chkhalo, NI 2019, 'Angle resolved photoelectron spectroscopy as applied to X-ray mirrors: an in depth study of Mo/ Si multilayer systems', Physical Chemistry Chemical Physics.

APA

Sakhonenkov, S., Filatova, E. O., Gaisin, A. U., Kasatikov, S. A., Konashuk, A. S., Pleshkov, R. S., & Chkhalo, N. I. (2019). Angle resolved photoelectron spectroscopy as applied to X-ray mirrors: an in depth study of Mo/ Si multilayer systems. Physical Chemistry Chemical Physics.

Vancouver

Sakhonenkov S, Filatova EO, Gaisin AU, Kasatikov SA, Konashuk AS, Pleshkov RS et al. Angle resolved photoelectron spectroscopy as applied to X-ray mirrors: an in depth study of Mo/ Si multilayer systems. Physical Chemistry Chemical Physics. 2019 Nov 7.

Author

Sakhonenkov, Sergei ; Filatova, Elena O. ; Gaisin, Aidar U. ; Kasatikov, Sergey A. ; Konashuk, Aleksei S. ; Pleshkov, Roman S. ; Chkhalo, Nikolai I. . / Angle resolved photoelectron spectroscopy as applied to X-ray mirrors: an in depth study of Mo/ Si multilayer systems. In: Physical Chemistry Chemical Physics. 2019.

BibTeX

@article{c85c549ef1a64e6a8ab932fefb101a07,
title = "Angle resolved photoelectron spectroscopy as applied to X-ray mirrors: an in depth study of Mo/ Si multilayer systems",
abstract = "We present approach adapted to study the interface (composition and extension) of the X-ray multilayer mirror using angular resolved photoelectron spectroscopy (ARXPS). In the approach we rely on the concept of average effective attenuation length L (EAL) of the photoelectron and not on the inelastic mean free path λ_i (IMPF) that allows us to take into account the contribution of elastically scattered electrons and to increase the accuracy of the determined thickness of layers. We apply the developed approach to study the formation of interfaces in the multilayer periodic Mo/Si mirror. Chemical composition and significance of the interfaces depending on the number of periods were investigated by means of ARXPS spectra decomposition technique. Formation of molybdenum silicide MoSi2 at the interfaces was revealed. It was shown that molybdenum silicide with different thickness is formed at the interfaces depending on the films order. In addition, it was established that increasing of periods number of the [Mo/Si] system leads to a decrease of the interface extension.",
author = "Sergei Sakhonenkov and Filatova, {Elena O.} and Gaisin, {Aidar U.} and Kasatikov, {Sergey A.} and Konashuk, {Aleksei S.} and Pleshkov, {Roman S.} and Chkhalo, {Nikolai I.}",
year = "2019",
month = nov,
day = "7",
language = "English",
journal = "Physical Chemistry Chemical Physics",
issn = "1463-9076",
publisher = "Royal Society of Chemistry",

}

RIS

TY - JOUR

T1 - Angle resolved photoelectron spectroscopy as applied to X-ray mirrors: an in depth study of Mo/ Si multilayer systems

AU - Sakhonenkov, Sergei

AU - Filatova, Elena O.

AU - Gaisin, Aidar U.

AU - Kasatikov, Sergey A.

AU - Konashuk, Aleksei S.

AU - Pleshkov, Roman S.

AU - Chkhalo, Nikolai I.

PY - 2019/11/7

Y1 - 2019/11/7

N2 - We present approach adapted to study the interface (composition and extension) of the X-ray multilayer mirror using angular resolved photoelectron spectroscopy (ARXPS). In the approach we rely on the concept of average effective attenuation length L (EAL) of the photoelectron and not on the inelastic mean free path λ_i (IMPF) that allows us to take into account the contribution of elastically scattered electrons and to increase the accuracy of the determined thickness of layers. We apply the developed approach to study the formation of interfaces in the multilayer periodic Mo/Si mirror. Chemical composition and significance of the interfaces depending on the number of periods were investigated by means of ARXPS spectra decomposition technique. Formation of molybdenum silicide MoSi2 at the interfaces was revealed. It was shown that molybdenum silicide with different thickness is formed at the interfaces depending on the films order. In addition, it was established that increasing of periods number of the [Mo/Si] system leads to a decrease of the interface extension.

AB - We present approach adapted to study the interface (composition and extension) of the X-ray multilayer mirror using angular resolved photoelectron spectroscopy (ARXPS). In the approach we rely on the concept of average effective attenuation length L (EAL) of the photoelectron and not on the inelastic mean free path λ_i (IMPF) that allows us to take into account the contribution of elastically scattered electrons and to increase the accuracy of the determined thickness of layers. We apply the developed approach to study the formation of interfaces in the multilayer periodic Mo/Si mirror. Chemical composition and significance of the interfaces depending on the number of periods were investigated by means of ARXPS spectra decomposition technique. Formation of molybdenum silicide MoSi2 at the interfaces was revealed. It was shown that molybdenum silicide with different thickness is formed at the interfaces depending on the films order. In addition, it was established that increasing of periods number of the [Mo/Si] system leads to a decrease of the interface extension.

UR - https://pubs.rsc.org/en/Content/ArticleLanding/2019/CP/C9CP04582A?utm_source=feedburner&utm_medium=feed&utm_campaign=Feed%3A+rss%2FCP+%28RSC+-+Phys.+Chem.+Chem.+Phys.+latest+articles%29#!divAbstract

M3 - Article

JO - Physical Chemistry Chemical Physics

JF - Physical Chemistry Chemical Physics

SN - 1463-9076

ER -

ID: 48472957