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About 200 years after Mohs - Nanoscratching LiB3O5. / Paufler, P.; Shakhverdova, I. P.; Bubnova, R. S.; Filatov, S. K.; Meyer, D. C.

In: Crystal Research and Technology, Vol. 43, No. 11, 01.11.2008, p. 1109-1116.

Research output: Contribution to journalArticlepeer-review

Harvard

Paufler, P, Shakhverdova, IP, Bubnova, RS, Filatov, SK & Meyer, DC 2008, 'About 200 years after Mohs - Nanoscratching LiB3O5', Crystal Research and Technology, vol. 43, no. 11, pp. 1109-1116. https://doi.org/10.1002/crat.200800339

APA

Paufler, P., Shakhverdova, I. P., Bubnova, R. S., Filatov, S. K., & Meyer, D. C. (2008). About 200 years after Mohs - Nanoscratching LiB3O5. Crystal Research and Technology, 43(11), 1109-1116. https://doi.org/10.1002/crat.200800339

Vancouver

Paufler P, Shakhverdova IP, Bubnova RS, Filatov SK, Meyer DC. About 200 years after Mohs - Nanoscratching LiB3O5. Crystal Research and Technology. 2008 Nov 1;43(11):1109-1116. https://doi.org/10.1002/crat.200800339

Author

Paufler, P. ; Shakhverdova, I. P. ; Bubnova, R. S. ; Filatov, S. K. ; Meyer, D. C. / About 200 years after Mohs - Nanoscratching LiB3O5. In: Crystal Research and Technology. 2008 ; Vol. 43, No. 11. pp. 1109-1116.

BibTeX

@article{2cfd059b72b8462795e27494138dbbba,
title = "About 200 years after Mohs - Nanoscratching LiB3O5",
abstract = "Though simple scratch hardness tests after Mohs are still used today, the development of diamond. nanoscratching equipment offers new possibilities to meet demands of modern nanotechnology. Preceding approaches to assign hardness values to materials are briefly reviewed, and scratch hardness is related to indentation hardness. Taking single-crystalline LiB3O5 as an example, the dependence of scratch morphology on the direction of scratching is demonstrated quantitatively. The coefficient of friction depends on normal load and varies between 0.25 and 0.37. Moreover, it is oscillating during scratching thus reflecting processes at nanoscale. Dislocation etch pits were observed due to scratching.",
keywords = "Anisotropy, Friction, Scratching",
author = "P. Paufler and Shakhverdova, {I. P.} and Bubnova, {R. S.} and Filatov, {S. K.} and Meyer, {D. C.}",
year = "2008",
month = nov,
day = "1",
doi = "10.1002/crat.200800339",
language = "English",
volume = "43",
pages = "1109--1116",
journal = "Crystal Research and Technology",
issn = "0232-1300",
publisher = "Wiley-Blackwell",
number = "11",

}

RIS

TY - JOUR

T1 - About 200 years after Mohs - Nanoscratching LiB3O5

AU - Paufler, P.

AU - Shakhverdova, I. P.

AU - Bubnova, R. S.

AU - Filatov, S. K.

AU - Meyer, D. C.

PY - 2008/11/1

Y1 - 2008/11/1

N2 - Though simple scratch hardness tests after Mohs are still used today, the development of diamond. nanoscratching equipment offers new possibilities to meet demands of modern nanotechnology. Preceding approaches to assign hardness values to materials are briefly reviewed, and scratch hardness is related to indentation hardness. Taking single-crystalline LiB3O5 as an example, the dependence of scratch morphology on the direction of scratching is demonstrated quantitatively. The coefficient of friction depends on normal load and varies between 0.25 and 0.37. Moreover, it is oscillating during scratching thus reflecting processes at nanoscale. Dislocation etch pits were observed due to scratching.

AB - Though simple scratch hardness tests after Mohs are still used today, the development of diamond. nanoscratching equipment offers new possibilities to meet demands of modern nanotechnology. Preceding approaches to assign hardness values to materials are briefly reviewed, and scratch hardness is related to indentation hardness. Taking single-crystalline LiB3O5 as an example, the dependence of scratch morphology on the direction of scratching is demonstrated quantitatively. The coefficient of friction depends on normal load and varies between 0.25 and 0.37. Moreover, it is oscillating during scratching thus reflecting processes at nanoscale. Dislocation etch pits were observed due to scratching.

KW - Anisotropy

KW - Friction

KW - Scratching

UR - http://www.scopus.com/inward/record.url?scp=55849129960&partnerID=8YFLogxK

U2 - 10.1002/crat.200800339

DO - 10.1002/crat.200800339

M3 - Article

AN - SCOPUS:55849129960

VL - 43

SP - 1109

EP - 1116

JO - Crystal Research and Technology

JF - Crystal Research and Technology

SN - 0232-1300

IS - 11

ER -

ID: 53957473