Research output: Contribution to journal › Article › peer-review
About 200 years after Mohs - Nanoscratching LiB3O5. / Paufler, P.; Shakhverdova, I. P.; Bubnova, R. S.; Filatov, S. K.; Meyer, D. C.
In: Crystal Research and Technology, Vol. 43, No. 11, 01.11.2008, p. 1109-1116.Research output: Contribution to journal › Article › peer-review
}
TY - JOUR
T1 - About 200 years after Mohs - Nanoscratching LiB3O5
AU - Paufler, P.
AU - Shakhverdova, I. P.
AU - Bubnova, R. S.
AU - Filatov, S. K.
AU - Meyer, D. C.
PY - 2008/11/1
Y1 - 2008/11/1
N2 - Though simple scratch hardness tests after Mohs are still used today, the development of diamond. nanoscratching equipment offers new possibilities to meet demands of modern nanotechnology. Preceding approaches to assign hardness values to materials are briefly reviewed, and scratch hardness is related to indentation hardness. Taking single-crystalline LiB3O5 as an example, the dependence of scratch morphology on the direction of scratching is demonstrated quantitatively. The coefficient of friction depends on normal load and varies between 0.25 and 0.37. Moreover, it is oscillating during scratching thus reflecting processes at nanoscale. Dislocation etch pits were observed due to scratching.
AB - Though simple scratch hardness tests after Mohs are still used today, the development of diamond. nanoscratching equipment offers new possibilities to meet demands of modern nanotechnology. Preceding approaches to assign hardness values to materials are briefly reviewed, and scratch hardness is related to indentation hardness. Taking single-crystalline LiB3O5 as an example, the dependence of scratch morphology on the direction of scratching is demonstrated quantitatively. The coefficient of friction depends on normal load and varies between 0.25 and 0.37. Moreover, it is oscillating during scratching thus reflecting processes at nanoscale. Dislocation etch pits were observed due to scratching.
KW - Anisotropy
KW - Friction
KW - Scratching
UR - http://www.scopus.com/inward/record.url?scp=55849129960&partnerID=8YFLogxK
U2 - 10.1002/crat.200800339
DO - 10.1002/crat.200800339
M3 - Article
AN - SCOPUS:55849129960
VL - 43
SP - 1109
EP - 1116
JO - Crystal Research and Technology
JF - Crystal Research and Technology
SN - 0232-1300
IS - 11
ER -
ID: 53957473