Research output: Contribution to journal › Article › peer-review
A technique for accurate FTIR determination of boron concentration in CVD homoepitaxial diamond layers. / Panov, Mikhail; Zubkov, Vasily; Solomnikova, Anna; Klepikov, Igor.
In: Materials Science and Engineering B, Vol. 303, 117334, 01.05.2024.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - A technique for accurate FTIR determination of boron concentration in CVD homoepitaxial diamond layers
AU - Panov, Mikhail
AU - Zubkov, Vasily
AU - Solomnikova, Anna
AU - Klepikov, Igor
PY - 2024/5/1
Y1 - 2024/5/1
N2 - The significant technology progress for fabrication of semiconducting CVD diamonds poses an important task of developing a precise and non-destructive method for estimation the boron content in epitaxial layers. We propose a novel two-step technique to determine the boron concentration in homoepitaxial diamond layers from FTIR measurements. The essence of the method is to evaluate the epilayer thickness from reflectance spectra at the first step, and to recalculate and analyze FTIR spectra in terms of effective optical density at the second step. Spectra are divided into 3 wavelength regions with accurate accounting of passing radiation through a multilayered structure with different thicknesses of absorbing media for various absorbing mechanisms. We havedemonstrated the benefit of the method for a set of samples with CVD homoepitaxial layers grown on various HPHT substrates. The data obtained from FTIR spectra are thoroughly compared to the charge carrier concentrationderived from electrical capacitance–voltage measurements.
AB - The significant technology progress for fabrication of semiconducting CVD diamonds poses an important task of developing a precise and non-destructive method for estimation the boron content in epitaxial layers. We propose a novel two-step technique to determine the boron concentration in homoepitaxial diamond layers from FTIR measurements. The essence of the method is to evaluate the epilayer thickness from reflectance spectra at the first step, and to recalculate and analyze FTIR spectra in terms of effective optical density at the second step. Spectra are divided into 3 wavelength regions with accurate accounting of passing radiation through a multilayered structure with different thicknesses of absorbing media for various absorbing mechanisms. We havedemonstrated the benefit of the method for a set of samples with CVD homoepitaxial layers grown on various HPHT substrates. The data obtained from FTIR spectra are thoroughly compared to the charge carrier concentrationderived from electrical capacitance–voltage measurements.
U2 - 10.1016/j.mseb.2024.117334
DO - 10.1016/j.mseb.2024.117334
M3 - Article
VL - 303
JO - Materials Science and Engineering B
JF - Materials Science and Engineering B
SN - 0921-5107
M1 - 117334
ER -
ID: 118542532