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A Self-Similar Regime of Droplet Growth with Allowance for the Stefan Flux and Dependence of Diffusion Coefficient on Vapor–Gas Medium Composition. / Kuchma, A. E.; Shchekin, A. K.

In: Colloid Journal, Vol. 74, No. 2, 2012, p. 215-222.

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@article{490182d4f6904c188f29352ae2cdc745,
title = "A Self-Similar Regime of Droplet Growth with Allowance for the Stefan Flux and Dependence of Diffusion Coefficient on Vapor–Gas Medium Composition",
abstract = "An analytical self-similar description is formulated for the problem of nonstationary diffusion droplet growth in a vapor–gas medium with allowance for the Stefan flux of the medium, themotion of the surface of a growing droplet, and an arbitrary concentration dependence of the diffusion coefficient of a condensing vapor in the medium. Analytical expressions are found for the diffusion profile of condensing vapor concentration and for the droplet growth rate at a constant diffusion coefficient of the vapor and at a coefficient linearly dependent on vapor concentration. The combined allowance for the Stefan flux of the medium, the motion of the surface of the growing droplet, and the dependence of the vapor diffusion coefficient in the medium on the vapor concentration is shown to result in renormalization of the rate of droplet growth related to the stationary diffusion regime. At small deviations from the stationarity, the Stefan flux, nonstationary diffusion, and dependence of the diffusion coefficient on t",
keywords = "drop condensation Stefan's flow self-similar solution",
author = "Kuchma, {A. E.} and Shchekin, {A. K.}",
year = "2012",
doi = "DOI: 10.1134/S1061933X12020056",
language = "English",
volume = "74",
pages = "215--222",
journal = "Colloid Journal",
issn = "1061-933X",
publisher = "Pleiades Publishing",
number = "2",

}

RIS

TY - JOUR

T1 - A Self-Similar Regime of Droplet Growth with Allowance for the Stefan Flux and Dependence of Diffusion Coefficient on Vapor–Gas Medium Composition

AU - Kuchma, A. E.

AU - Shchekin, A. K.

PY - 2012

Y1 - 2012

N2 - An analytical self-similar description is formulated for the problem of nonstationary diffusion droplet growth in a vapor–gas medium with allowance for the Stefan flux of the medium, themotion of the surface of a growing droplet, and an arbitrary concentration dependence of the diffusion coefficient of a condensing vapor in the medium. Analytical expressions are found for the diffusion profile of condensing vapor concentration and for the droplet growth rate at a constant diffusion coefficient of the vapor and at a coefficient linearly dependent on vapor concentration. The combined allowance for the Stefan flux of the medium, the motion of the surface of the growing droplet, and the dependence of the vapor diffusion coefficient in the medium on the vapor concentration is shown to result in renormalization of the rate of droplet growth related to the stationary diffusion regime. At small deviations from the stationarity, the Stefan flux, nonstationary diffusion, and dependence of the diffusion coefficient on t

AB - An analytical self-similar description is formulated for the problem of nonstationary diffusion droplet growth in a vapor–gas medium with allowance for the Stefan flux of the medium, themotion of the surface of a growing droplet, and an arbitrary concentration dependence of the diffusion coefficient of a condensing vapor in the medium. Analytical expressions are found for the diffusion profile of condensing vapor concentration and for the droplet growth rate at a constant diffusion coefficient of the vapor and at a coefficient linearly dependent on vapor concentration. The combined allowance for the Stefan flux of the medium, the motion of the surface of the growing droplet, and the dependence of the vapor diffusion coefficient in the medium on the vapor concentration is shown to result in renormalization of the rate of droplet growth related to the stationary diffusion regime. At small deviations from the stationarity, the Stefan flux, nonstationary diffusion, and dependence of the diffusion coefficient on t

KW - drop condensation Stefan's flow self-similar solution

U2 - DOI: 10.1134/S1061933X12020056

DO - DOI: 10.1134/S1061933X12020056

M3 - Article

VL - 74

SP - 215

EP - 222

JO - Colloid Journal

JF - Colloid Journal

SN - 1061-933X

IS - 2

ER -

ID: 5324656