Research output: Contribution to journal › Article › peer-review
A Self-Similar Regime of Droplet Growth with Allowance for the Stefan Flux and Dependence of Diffusion Coefficient on Vapor–Gas Medium Composition. / Kuchma, A. E.; Shchekin, A. K.
In: Colloid Journal, Vol. 74, No. 2, 2012, p. 215-222.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - A Self-Similar Regime of Droplet Growth with Allowance for the Stefan Flux and Dependence of Diffusion Coefficient on Vapor–Gas Medium Composition
AU - Kuchma, A. E.
AU - Shchekin, A. K.
PY - 2012
Y1 - 2012
N2 - An analytical self-similar description is formulated for the problem of nonstationary diffusion droplet growth in a vapor–gas medium with allowance for the Stefan flux of the medium, themotion of the surface of a growing droplet, and an arbitrary concentration dependence of the diffusion coefficient of a condensing vapor in the medium. Analytical expressions are found for the diffusion profile of condensing vapor concentration and for the droplet growth rate at a constant diffusion coefficient of the vapor and at a coefficient linearly dependent on vapor concentration. The combined allowance for the Stefan flux of the medium, the motion of the surface of the growing droplet, and the dependence of the vapor diffusion coefficient in the medium on the vapor concentration is shown to result in renormalization of the rate of droplet growth related to the stationary diffusion regime. At small deviations from the stationarity, the Stefan flux, nonstationary diffusion, and dependence of the diffusion coefficient on t
AB - An analytical self-similar description is formulated for the problem of nonstationary diffusion droplet growth in a vapor–gas medium with allowance for the Stefan flux of the medium, themotion of the surface of a growing droplet, and an arbitrary concentration dependence of the diffusion coefficient of a condensing vapor in the medium. Analytical expressions are found for the diffusion profile of condensing vapor concentration and for the droplet growth rate at a constant diffusion coefficient of the vapor and at a coefficient linearly dependent on vapor concentration. The combined allowance for the Stefan flux of the medium, the motion of the surface of the growing droplet, and the dependence of the vapor diffusion coefficient in the medium on the vapor concentration is shown to result in renormalization of the rate of droplet growth related to the stationary diffusion regime. At small deviations from the stationarity, the Stefan flux, nonstationary diffusion, and dependence of the diffusion coefficient on t
KW - drop condensation Stefan's flow self-similar solution
U2 - DOI: 10.1134/S1061933X12020056
DO - DOI: 10.1134/S1061933X12020056
M3 - Article
VL - 74
SP - 215
EP - 222
JO - Colloid Journal
JF - Colloid Journal
SN - 1061-933X
IS - 2
ER -
ID: 5324656