Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Modeling the Radial Growth of Self-Catalyzed III-V Nanowires. / Dubrovskii, Vladimir G.; Leshchenko, Egor D.
в: Nanomaterials, Том 12, № 10, 1698, 16.05.2022.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Modeling the Radial Growth of Self-Catalyzed III-V Nanowires
AU - Dubrovskii, Vladimir G.
AU - Leshchenko, Egor D.
N1 - Dubrovskii, V.G.; Leshchenko, E.D. Modeling the Radial Growth of Self-Catalyzed III-V Nanowires. Nanomaterials 2022, 12, 1698. https://doi.org/10.3390/nano12101698
PY - 2022/5/16
Y1 - 2022/5/16
N2 - A new model for the radial growth of self-catalyzed III-V nanowires on different substrates is presented, which describes the nanowire morphological evolution without any free parameters. The model takes into account the re-emission of group III atoms from a mask surface and the shadowing effect in directional deposition techniques such as molecular beam epitaxy. It is shown that radial growth is faster for larger pitches of regular nanowire arrays or lower surface density, and can be suppressed by increasing the V/III flux ratio or decreasing re-emission. The model describes quite well the data on the morphological evolution of Ga-catalyzed GaP and GaAs nanowires on different substrates, where the nanowire length increases linearly and the radius enlarges sub-linearly with time. The obtained analytical expressions and numerical data should be useful for morphological control over different III-V nanowires in a wide range of growth conditions.
AB - A new model for the radial growth of self-catalyzed III-V nanowires on different substrates is presented, which describes the nanowire morphological evolution without any free parameters. The model takes into account the re-emission of group III atoms from a mask surface and the shadowing effect in directional deposition techniques such as molecular beam epitaxy. It is shown that radial growth is faster for larger pitches of regular nanowire arrays or lower surface density, and can be suppressed by increasing the V/III flux ratio or decreasing re-emission. The model describes quite well the data on the morphological evolution of Ga-catalyzed GaP and GaAs nanowires on different substrates, where the nanowire length increases linearly and the radius enlarges sub-linearly with time. The obtained analytical expressions and numerical data should be useful for morphological control over different III-V nanowires in a wide range of growth conditions.
KW - Modeling
KW - Molecular beam epitaxy
KW - Radial growth
KW - Self-catalyzed III-V nanowires
UR - http://www.scopus.com/inward/record.url?scp=85132547822&partnerID=8YFLogxK
UR - https://www.mendeley.com/catalogue/7461c0c3-2297-3ace-9b88-8e83f83ffb5b/
U2 - 10.3390/nano12101698
DO - 10.3390/nano12101698
M3 - Article
C2 - 35630920
AN - SCOPUS:85132547822
VL - 12
JO - Nanomaterials
JF - Nanomaterials
SN - 2079-4991
IS - 10
M1 - 1698
ER -
ID: 100331637