Research output: Contribution to journal › Article › peer-review
A theoretical description of chloride vapour-phase epitaxy (CVPE) has been proposed which contains two-dimensional (2D) gas-dynamic equations for transport of reactive components and kinetic equations for surface growth processes connected by nonlinear adiabatic boundary conditions. No one of these stages is supposed to be the limiting one. Calculated variations of growth rate and impurity concentrations along the growing layer fit experimental data well.
Original language | English |
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Article number | 002 |
Pages (from-to) | 1935-1943 |
Number of pages | 9 |
Journal | Semiconductor Science and Technology |
Volume | 8 |
Issue number | 11 |
DOIs | |
State | Published - 1 Dec 1993 |
ID: 39890827