Fabrication of nanopores in silicon nitride membrane by means of wet etching enhanced by focused helium ion beam irradiation

Research output

Abstract

We investigated the formation of nanopores in silicon nitride membrane by means of wet etching. The membrane was irradiated with focused helium ion beam using helium ion microscope, and then etched in hydrofluoric acid. Nanopores were investigated with transmission electron microscope. The pores with a diameter from 10 to 100 nm were obtained. Dependence of the pore diameter on the number of helium ions was investigated and compared with space distribution of radiation-induced defects, which was obtained from Monte-Carlo simulation.

Original languageEnglish
Title of host publicationState-of-the-Art Trends of Scientific Research of Artificial and Natural Nanoobjects, STRANN 2018
EditorsYuri Petrov, Oleg Vyvenko
PublisherAmerican Institute of Physics
Volume2064
ISBN (Electronic)9780735417922
DOIs
Publication statusPublished - 15 Jan 2019
EventInternational Conference on State-of-the-Art Trends of Scientific Research of Artificial and Natural Nanoobjects, STRANN 2018 - Moscow
Duration: 17 Oct 201819 Oct 2018

Conference

ConferenceInternational Conference on State-of-the-Art Trends of Scientific Research of Artificial and Natural Nanoobjects, STRANN 2018
CountryRussian Federation
CityMoscow
Period17/10/1819/10/18

Fingerprint

helium ions
silicon nitrides
ion beams
etching
membranes
fabrication
irradiation
porosity
ion microscopes
hydrofluoric acid
electron microscopes
defects
radiation
simulation

Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Petrov, Y. V., Ubyivovk, E. V., & Baraban, A. P. (2019). Fabrication of nanopores in silicon nitride membrane by means of wet etching enhanced by focused helium ion beam irradiation. In Y. Petrov, & O. Vyvenko (Eds.), State-of-the-Art Trends of Scientific Research of Artificial and Natural Nanoobjects, STRANN 2018 (Vol. 2064). [030012] American Institute of Physics. https://doi.org/10.1063/1.5087674
Petrov, Yu V. ; Ubyivovk, E. V. ; Baraban, A. P. / Fabrication of nanopores in silicon nitride membrane by means of wet etching enhanced by focused helium ion beam irradiation. State-of-the-Art Trends of Scientific Research of Artificial and Natural Nanoobjects, STRANN 2018. editor / Yuri Petrov ; Oleg Vyvenko. Vol. 2064 American Institute of Physics, 2019.
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abstract = "We investigated the formation of nanopores in silicon nitride membrane by means of wet etching. The membrane was irradiated with focused helium ion beam using helium ion microscope, and then etched in hydrofluoric acid. Nanopores were investigated with transmission electron microscope. The pores with a diameter from 10 to 100 nm were obtained. Dependence of the pore diameter on the number of helium ions was investigated and compared with space distribution of radiation-induced defects, which was obtained from Monte-Carlo simulation.",
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Petrov, YV, Ubyivovk, EV & Baraban, AP 2019, Fabrication of nanopores in silicon nitride membrane by means of wet etching enhanced by focused helium ion beam irradiation. in Y Petrov & O Vyvenko (eds), State-of-the-Art Trends of Scientific Research of Artificial and Natural Nanoobjects, STRANN 2018. vol. 2064, 030012, American Institute of Physics, Moscow, 17/10/18. https://doi.org/10.1063/1.5087674

Fabrication of nanopores in silicon nitride membrane by means of wet etching enhanced by focused helium ion beam irradiation. / Petrov, Yu V.; Ubyivovk, E. V.; Baraban, A. P.

State-of-the-Art Trends of Scientific Research of Artificial and Natural Nanoobjects, STRANN 2018. ed. / Yuri Petrov; Oleg Vyvenko. Vol. 2064 American Institute of Physics, 2019. 030012.

Research output

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T1 - Fabrication of nanopores in silicon nitride membrane by means of wet etching enhanced by focused helium ion beam irradiation

AU - Petrov, Yu V.

AU - Ubyivovk, E. V.

AU - Baraban, A. P.

PY - 2019/1/15

Y1 - 2019/1/15

N2 - We investigated the formation of nanopores in silicon nitride membrane by means of wet etching. The membrane was irradiated with focused helium ion beam using helium ion microscope, and then etched in hydrofluoric acid. Nanopores were investigated with transmission electron microscope. The pores with a diameter from 10 to 100 nm were obtained. Dependence of the pore diameter on the number of helium ions was investigated and compared with space distribution of radiation-induced defects, which was obtained from Monte-Carlo simulation.

AB - We investigated the formation of nanopores in silicon nitride membrane by means of wet etching. The membrane was irradiated with focused helium ion beam using helium ion microscope, and then etched in hydrofluoric acid. Nanopores were investigated with transmission electron microscope. The pores with a diameter from 10 to 100 nm were obtained. Dependence of the pore diameter on the number of helium ions was investigated and compared with space distribution of radiation-induced defects, which was obtained from Monte-Carlo simulation.

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BT - State-of-the-Art Trends of Scientific Research of Artificial and Natural Nanoobjects, STRANN 2018

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Petrov YV, Ubyivovk EV, Baraban AP. Fabrication of nanopores in silicon nitride membrane by means of wet etching enhanced by focused helium ion beam irradiation. In Petrov Y, Vyvenko O, editors, State-of-the-Art Trends of Scientific Research of Artificial and Natural Nanoobjects, STRANN 2018. Vol. 2064. American Institute of Physics. 2019. 030012 https://doi.org/10.1063/1.5087674