Characterization of High-k Dielectrics Internal Structure by X-Ray Spectroscopy and Reflectometry: New Approaches to Interlayer Identification and Analysis (Chapter 7)

E. O. Filatova, I. V. Kozhevnikov, A. A. Sokolov

Research output: Chapter in Book/Report/Conference proceedingChapterResearch

8 Scopus citations
Original languageEnglish
Title of host publicationHigh –k Gate Dielectrics for CMOS Technology / Ed. by Gang He, Zhaoqi Sun
PublisherWiley-Blackwell
Pages558, 225-271
ISBN (Print)978-3-527-33032-4
DOIs
StatePublished - 2012

Cite this