Atomic layer deposition of lithium oxide, tin oxide, and lithiated tin oxide nanofilms for high performance thin film batteries anodes.

M. Maximov, D. Nazarov, I. Mitrofanov, Y. Koshtyal, A. Rymyantsev, A. Popovich

Research output: Contribution to conferenceAbstract

3 Scopus citations

Abstract

In recent years atomic layer deposition has proved to be a successful method of fabrication and modification of electrodes for lithium-ion batteries and thin film power sources. Tin oxide demonstrated considerable excellence over currently used materials for thin film batteries anodes, however, lithiated tin oxides are expected to show even better performance. In this research nanofilms of LiOx, SnO 2 and lithiated tin oxide were deposited by atomic layer deposition (ALD) using lithium hexamethyldisilylazide (LiN[Si(CH3)2]2, LiHMDS), tetraethyl tin (Sn(C2H5)4, TET) as the metal-containing reagents and water or ozone or oxygen plasma as co-reagents. The monocrystalline silicon (100) and stainless steel (316SS) were used as supports. The thickness of the films was measured with spectral ellipsometry. The composition was studied by X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry. Regardless of the type of coreagent, the resulting films are unstable under long-term
Original languageEnglish
Pages169-174
StatePublished - 2019
Externally publishedYes

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