Area-Selective Growth of HfS2 Thin Films via Atomic Layer Deposition at Low Temperature

Yuanyuan Cao, Tobias Wähler, Hyoungwon Park, Johannes Will, Annemarie Prihoda, Narine Moses Badlyan, Lukas Fromm, Tadahiro Yokosawa, Bingzhe Wang, Dirk M. Guldi, Andreas Görling, Janina Maultzsch, Tobias Unruh, Erdmann Spiecker, Marcus Halik, Jörg Libuda, Julien Bachmann

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Engineering & Materials Science